EuNiO3 thin films- growth and characterization

Journal of Physics: Conference Series

Volumn 289, Issue 1, 2011, Pages

  Bilewska, K ^a   Wolna, E ^a,b   Edely, M ^c   Ruello, P ^c   Szade, J ^a  

^a UNIVERSITY OF SILESIA   (Poland)

^b Hutchinson Poland Sp z oo Zywiec 1 ^*  (Poland)

^c UNIVERSITÉ DU MAINE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DEPTH PROFILING; MAGNETRON SPUTTERING; NICKEL; PHOTOEMISSION; SUBSTRATES; X RAY DIFFRACTION;

HIGH-PRESSURE AND TEMPERATURES; OPTIMIZATION CONDITIONS; OXYGEN STOICHIOMETRY; RADIO FREQUENCY MAGNETRON SPUTTERING; SURFACE CONTAMINATIONS; THICKNESS OF THE FILM; X-RAY DIFFRACTION MEASUREMENTS; X-RAY PHOTOEMISSIONS;

THIN FILMS;

EID: 79959239252     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/289/1/012014     Document Type: Conference Paper

References (6)

1. Alonso J A, Martínez-Lope M J and Rasines I 1995 J. Solid State Chem. 120 174
2. Laffez P, Zaghrioui M, Retoux R and Lacorre P 2000 J. Magn. Magn. Mater. 211 111
3. Barman S R, Chainani A and Sarma D D 1994 Phys. Rev. B 49 8475
4. Galicka K, Szade J, Ruello P, Laffez P and Ratuszna A 2009 Appl. Surf. Sci. 255 4355
5. Galicka K 2005 Contribution to the study of the electronic states of rare earth oxide thin films by XPS and the Raman spectroscopy Physics Co-tutelle Doctor's Thesis (Katowice: University of Silesia, Le Mans: University of Maine)
6. Mizokawa T, Fujimori A, Arima T, Yokura Y, Mori N and Akimitsu J 1995 Phys. Rev. B 52 13865