Direct laser patterning of self-assembled monolayer using elliptical laser beams: A theoretical parametric study

Optics and Laser Technology

Volumn 43, Issue 8, 2011, Pages 1377-1384

  Zhang, Martin Y ^a,b   Shadnam, Mohammad Reza ^a,c   Amirfazli, A ^a  

^a UNIVERSITY OF ALBERTA   (Canada)

^b SCHOOL OF INDUSTRIAL ENGINEERING   (United States)

^c KPMG   (Netherlands)

Author keywords

Elliptical beam; Patterning; Self assembled monolayer

Indexed keywords

CIRCULAR BEAMS; DESORPTION TEMPERATURES; EDGE DEFINITION; ELLIPTICAL BEAMS; ELLIPTICAL LASER BEAMS; FEATURE SIZES; HEAT DIFFUSIONS; LASER PATTERNING; LASER POWER; LOCALIZED HEATING; PARAMETRIC ANALYSIS; PARAMETRIC STUDY; PATTERNING; PROCESSING PARAMETERS; SCANNING VELOCITY; SHARP EDGES; SHEDDING LIGHT; SURFACE TEMPERATURES; THERMAL DAMAGE; THERMOKINETICS; TRANSITION WIDTHS; WORKING CONDITIONS;

ASPECT RATIO; DAMAGE DETECTION; DESORPTION; HEATING; LASER BEAMS; OPTIMIZATION; ORGANIC POLYMERS;

SELF ASSEMBLED MONOLAYERS;

EID: 79958143882     PISSN: 00303992     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optlastec.2011.03.034     Document Type: Article

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