Evaluation of the influence of bias voltage on the corrosion resistance of Al-Nb-N thin films;Evaluación de la influencia del voltaje bias sobre la resistencia a la corrosión de películas delgadas de Al-Nb-N

DYNA (Colombia)

Volumn 77, Issue 162, 2010, Pages 161-168

  Nieto, Jahir ^a   Caicedo, Julio ^b   Amaya, César ^a,b   Moreno, Henry ^a   Aperador, William ^c   Tirado, Liliana ^d   Bejarano, Gilberto ^e  

^a Laboratorio de Recubrimientos Duros   (Colombia)

^b UNIVERSIDAD DEL VALLE   (Colombia)

^c ESCUELA COLOMBIANA DE INGENIERÍA JULIO GARAVITO   (Colombia)

^d UNIVERSIDAD DEL QUINDÍO   (Colombia)

^e UNIVERSIDAD DE ANTIOQUIA   (Colombia)

Author keywords

Aluminum niobium nitride; Corrosion; Electrochemistry; Magnetron sputtering

Indexed keywords

EID: 79958127397     PISSN: 00127353     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (15)

1. ALESSANDRINI, E.I, SADAGOPAN, V. and LAIBOWITZ, R.B. Relationship between Structure and Sputtering Parameters in NbN Films, J. Vac. Sci. Technol. 8 (1), 188-191, 1971
2. SINGERA, I.L., BOLSTERA, R.N., WOLFA, S.A., SKELTONA, E.F. and JEFFRIESB R.A. Abrasion resistance, microhardness and microstructures of singlephase niobium nitride films. Thin Solid Films 107, 207-215, 1983
3. MOLARIUS, J.M., KORHONEN, A.S., HARJU, E. and LAPPALAINEN, R. Comparison of cutting performance of ionplated NbN, ZrN, TiN and (Ti, Al)N coatings, Surf. Coat. Technol. 33, 117-132, 1987.
4. SAUNDERS, N., MIODOWNIK, A.P., RANGIHA, J. Use of vapour codeposited thin films containing concentration gradients in the rapid assessment of phase equilibria in binary and ternary alloy systems. J. Mater. Sci. Lett. 6, 1179-1188, 1987
5. SELINDER, T.I, MILLER, D.J., GRAY, K.E., SARDELA, M.R.J., HULTMAN, L. Phase formation and microstructure of Nb1-xAlxN alloy films grown on MgO (001) by reactive sputtering: a new ternary phase. Vacuum 46 (12) 1401-1406, 1995.
6. XIAODONG WANG., HIPPS, K.W., DICKINSO, J.T., URSULA M. Amorphous or nanocrystalline AlN thin films formed from AlN: H, J. Mater Res., 9, 1449-1455, 1994.
7. HARISH, C., BARSHILIA, B., DEEPTHI, K.S., RAJAM, K., PREET B., SUJEET C. Structure and properties of reactive direct current magnetron sputtered niobium aluminium nitride coatings, Journal of Mater. Research 25, 1258-1268, 2008.
8. WONG, M.S., SPROUL, W.D., CHU, X. and BARNETT S.A. Reactive magnetron sputter deposition of niobium nitride films, J. Vac. Sci. Technol. 11, (A) 1528-1536, 1993.
9. LECHTHALER, M. and NEFF, F. Development and Properties of Advanced Nitride Coatings for Tooling Applications. Proceedings. 36 th ICMCTF 2009.
10. AZUMA, Y., HUANG, G., LYNE, M.P.J., MERER, A.J. and V.I. SRDANOV, Hyperfine Structure in High Spin Multiplicity Electronic States: Analysis of the B 4 X 4 Transition of Gaseous NbO, J. Chem. Phys. 100, 4133-4155, 1994.
11. CHEN, M., WANG, X. and QIN, Q. Characterization of the products generated from laser ablation of Nb2O5 using matrix isolation FTIR spectroscopy. Applied Surface Science, 156, 16-20(5), 2000
12. RAM, R.S., RINSKOPF, N., LIÉVIN, J. and BERNATH P.F. Fourier transform emission spectroscopy and ab initio calculations on NbC, Journal of Molecular Spectroscopy 201, 267-279, 2000.
13. RANDLES, J.E.B. Surface tension of dilute acid solutions. Discuss. Faraday Soc. 1, 11, 1947.
14. SCHÄFER, H. and STOCK H.R. Improving the corrosion protection of aluminum alloys using reactive magnetron sputtering., Corrosion Science 47, 953-960, 2005.
15. Nieto, J., Caicedo, J.C, Amaya, C., Aperador, W., Moreno, H., Peñafiel, J.A. and Tiradomejía, L. Efecto del Voltaje de Polarización Sobre la Resistencia a la Corrosión de Películas de Nitruro de Niobio (NbN), Revista Colombiana de Física, 411,2009.