Rational engineering of highly sensitive SERS substrate based on nanocone structures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7673, Issue , 2010, Pages

  Wu, Wei ^a   Hu, Min ^a   Ou, Fung Suong ^a   Williams, R Stanley ^a   Li, Zhiyong ^a  

^a HEWLETT PACKARD LABORATORIES   (United States)

Author keywords

3D nanoimprinting; nanocones; nanoimprint lithography; sensor; SERS

Indexed keywords

CROSS-LINKED POLYMERS; ENHANCEMENT FACTOR; ENHANCEMENT MECHANISM; ETCHING PROCESS; HIGHLY SENSITIVE; NANO-IMPRINTING; NANOCONE; NANOCONE STRUCTURES; NANOCONES; SCATTERED LIGHT; SERS; SERS ENHANCEMENT; SERS SUBSTRATE; SI NANOCONES; SINGLE CRYSTALLINE SILICON; SURFACE ENHANCED RAMAN SPECTROSCOPY;

CROSSLINKING; ETHYLENE; NANOIMPRINT LITHOGRAPHY; RAMAN SPECTROSCOPY; THREE DIMENSIONAL;

SUBSTRATES;

EID: 79957940139     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.849959     Document Type: Conference Paper

References (5)

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2. J. Tang, F. S. Ou, H. P. Kuo, W. F. Stickle, Z. Li, R. S. Williams, "Metal Coated Si Nanograss as Highly Sensitive Surface-enhanced Raman Spectroscopy Substrates," Appl. Phys. A., 96, 793-797 (2009).
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