Capitalizing on the glass-etching effect of silver plating chemistry to contact si solar cells with homogeneous 100110 Ω/sq emitters

IEEE Electron Device Letters

Volumn 32, Issue 6, 2011, Pages 779-781

  Ebong, Abasifreke ^a,b   Cooper, Ian B ^b   Rounsaville, Brian C ^b   Rohatgi, Ajeet ^b   Dovrat, Miki ^c   Kritchman, Eli ^c   Brusilovsky, David ^c   Benichou, Axel ^c  

^a University of North Carolina at Charlotte   (United States)

^b GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^c Xjet Solar Ltd   (Israel)

Author keywords

High efficiency solar cells; homogeneous high sheet resistance emitter (HHSE); ink jetted cells; silicon solar cells

Indexed keywords

FILL FACTOR; HIGH QUALITY; HIGH-EFFICIENCY SOLAR CELLS; HIGH-SHEET-RESISTANCE EMITTER; NARROW-LINE WIDTH; PLATING CHEMISTRY; SCREEN-PRINTED; SI SOLAR CELLS; SURFACE PASSIVATION;

CONTACT RESISTANCE; EFFICIENCY; GLASS; PASSIVATION; SILICON SOLAR CELLS; SILVER PLATING;

ETCHING;

EID: 79957591811     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2011.2131115     Document Type: Article

References (8)

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