Sputter deposited nanometric multi-scale rough Cd-CdO superhydrophobic thin films

Nanoscience and Nanotechnology Letters

Volumn 3, Issue 3, 2011, Pages 300-305

  Barshilia, Harish C ^a   Rajam, K S ^a  

^a SURFACE ENGINEERING DIVISION   (India)

Author keywords

Cd CdO Thin Films; Nanometric Multi Scale Roughness; Sputtering; Superhydrophobicity; Thermal Oxidation

Indexed keywords

CD-CDO THIN FILMS; COATING THICKNESS; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; GLASS SUBSTRATES; MICRO RAMAN SPECTROSCOPY; MICRON SCALE; MULTISCALES; NANOMETRIC SCALE; NANOMETRICS; OXIDATION TEMPERATURE; OXYGEN FLOW RATES; POROUS MICROSTRUCTURE; SUPERHYDROPHOBIC; SUPERHYDROPHOBICITY; THERMAL OXIDATION;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; COATINGS; CONTACT ANGLE; FIELD EMISSION; FIELD EMISSION MICROSCOPES; FILM PREPARATION; HYDROPHOBICITY; NANOCLUSTERS; OXIDATION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THICKNESS MEASUREMENT; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION;

CADMIUM COMPOUNDS;

EID: 79957495664     PISSN: 19414900     EISSN: 19414919     Source Type: Journal    
DOI: 10.1166/nnl.2011.1185     Document Type: Article

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