Fabrication of silicon wafer with ultra low reflectance by chemical etching method

Applied Surface Science

Volumn 257, Issue 17, 2011, Pages 7411-7414

  Cao, Yingli ^a   Liu, Aimin ^a   Li, Honghao ^a   Liu, Yiting ^a   Qiao, Fen ^a   Hu, Zengquan ^a   Sang, Yongcang ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Etching; Nanowires; Pyramids; Reflectance

Indexed keywords

ETCHING; FABRICATION; MONOCRYSTALLINE SILICON; NANOWIRES; REFLECTION;

BINARY STRUCTURES; CHEMICAL ETCHING; ETCHING TIME; EXPERIMENTAL EVIDENCE; FORMATION MECHANISM; OPTIMIZED CONDITIONS; PYRAMIDS; SILICON NANOWIRES;

SILICON WAFERS;

EID: 79957468945     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.02.102     Document Type: Article

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