Antibacterial Properties and Corrosion Resistance of Nitrogen-doped TiO2 Coatings on Stainless Steel

Journal of Materials Science and Technology

Volumn 27, Issue 4, 2011, Pages 309-316

  Wang, Hefeng ^a,b   Tang, Bin ^a   Li, Xiuyan ^a   Ma, Yong ^a  

^a TAIYUAN UNIVERSITY OF TECHNOLOGY   (China)

^b SHANXI DATONG UNIVERSITY   (China)

Author keywords

Antibacterial property; Corrosion; Nitrogen doping; Stainless steel; Titanium dioxide

Indexed keywords

ANTIBACTERIAL PROPERTIES; ANTIBACTERIAL TESTS; AUSTENITIC; COMPOSITION ANALYSIS; CORROSION CURRENT DENSITIES; CORROSION POTENTIALS; CORROSION PROPERTY; CORROSION TESTS; CREVICE CORROSION; ELECTROCHEMICAL MEASUREMENTS; HANKS' SOLUTION; IMPEDANCE SPECTRUM; MICROSTRUCTURAL INVESTIGATION; NITROGEN DOPING; NITROGEN-DOPED; NOISE TEST; PLASMA SURFACE ALLOYING TECHNIQUE; TIO; TITANIUM NITRIDE COATING;

ALLOYING; AUSTENITE; AUSTENITIC STAINLESS STEEL; CORROSION RESISTANCE; CORROSION RESISTANT ALLOYS; DOPING (ADDITIVES); ELECTROCHEMISTRY; NITROGEN; NITROGEN PLASMA; PROTECTIVE COATINGS; SUBSTRATES; TESTING; TITANIUM; TITANIUM NITRIDE; X RAY DIFFRACTION;

TITANIUM DIOXIDE;

EID: 79956330187     PISSN: 10050302     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1005-0302(11)60067-4     Document Type: Article

References (25)

1. Bahna P., Dvorak T., Hanna H., Yasko A.W., Hachem R., Raad I. Int. J. Anti-microb. Agents 2007, 29:593.
2. Darouiche R.O. N. Engl. J. Med. 2004, 350:1422.
3. Flock J.I., Brennan F. Trends. Microbiol. 1999, 7:140.
4. Zhao Q., Liu Y., Wang C., Wang S. Appl. Surf. Sci. 2007, 253:7254.
5. Zhang Z.X., Jiang L.Z., Lin G., Xu Z. J. Mater. Sci. Technol. 2008, 24:781.
6. de Damborenea J.J., Cristóbal A.B., Arenas M.A., López V., Conde A. Mater. Lett. 2007, 61:821.
7. Hong I.T., Koo C.H. Mater. Sci. Eng. A 2005, 393:213.
8. Dan Z.G., Ni H.W., Xu B.F., Xiong J., Xiong P.Y. Thin Solid Films 2005, 492:93.
9. Kwok S.C.H., Zhang W., Wan G.J., McKenzie D.R., Bilek M.M.M., Chu P.K. Diam. Relat. Mater. 2007, 16:1353.
10. Choi H.W., Dauskardt R.H., Lee S.C., Lee K.R., Oh K.H. Diam. Relat. Mater. 2008, 17:252.
11. Morikawa T., Asahi R., Ohwaki T., Aoki K., Taga Y. Jpn. J. Appl. Phys. 2001, 40:L561. (in Japanese).
12. Cui X.L., Ma M., Zhang W., Yang Y.C., Zhang Z.J. Electrochem. Commun. 2008, 10:367.
13. Xu Z., Fang B.H., Zheng W.N., Wang C.Z., Tang B. Surf. Coat. Technol. 1990, 43-44:1065.
14. Dong F., Zhao W.R., Wu Z.B. Nanotechnology 2008, 19:365607.
15. Sakthivel S., Kisch H. Angew. Chem. Int. Edit. 2003, 42:4908.
16. Gopinath C.S. J. Phys. Chem. B 2006, 110:7079.
17. Metwally I.A., Al-Mandhari H.M., Gastli A., Nadir Z. Eng. Anal. Bound. Elem. 2007, 31:485.
18. Zhang J.Q., Cao C.N. Corros. Prot. 1998, 19:99. (in Chinese).
19. Morrison F.D., Jung D.J., Scott J.F. J. Appl. Phys. 2007, 101:094112.
20. Hashimoto M., Miyajima S., Murata T. Corros. Sci. 1992, 33:917.
21. Pistorius P.C., Burstein G.T. Corros. Sci. 1992, 33:1885.
22. Lee H.Y., Park Y.H., Ko K.H. Langmuir 2000, 16:7289.
23. Huang Z., Maness P.C., Blake D.M., Wolfrum E.J., Smolinski S.L., Jacoby W.A. J. Photochem. Photobiol. A. Chem. 2000, 130:163.
24. Halliwell B., Gutteridge J.M.C. Free Radicals in Biology and Medicine 1989, 540. Oxford University Press, New York.
25. Lonnen J., Kilvington S., Kehoe S.C., Al-Touati F., McGuigan K.G. Water Res. 2005, 39:877.