Pattern-induced ripple structures at silicon-oxide/silicon interface by excimer laser irradiation

Applied Physics Letters

Volumn 81, Issue 7, 2002, Pages 1344-1346

  Chen, X Y ^a   Lu, Y F ^a   Cho, B J ^a   Zeng, Y P ^a   Zeng, J N ^a   Wu, Y H ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY EFFECTS; COMBINED EFFECT; KRF EXCIMER LASER; OPENED WINDOWS; PATTERNED SILICON; RIPPLE STRUCTURE; SCATTERED WAVES; SILICON SURFACES; SURFACE STRESS; THIN LAYERS;

EXCIMER LASERS; SILICON COMPOUNDS; SILICON OXIDES;

IRRADIATION;

EID: 79956055702     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1496141     Document Type: Article

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