Determination of free hole concentration in ferromagnetic Ga 1-xMnxAs using electrochemical capacitance-voltage profiling

Applied Physics Letters

Volumn 81, Issue 5, 2002, Pages 844-846

  Yu, K M ^a   Walukiewicz, W ^a   Wojtowicz, T ^b,c   Lim, W L ^c   Liu, X ^c   Sasaki, Y ^c   Dobrowolska, M ^c   Furdyna, J K ^c  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b INSTITUTE OF PHYSICS   (Poland)

^c UNIVERSITY OF NOTRE DAME   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANOMALOUS HALL EFFECTS; ELECTROCHEMICAL CAPACITANCE-VOLTAGE PROFILING; FREE HOLE CONCENTRATION; LOW-TEMPERATURE-GROWN GAAS; P-TYPE; SEMI-CONDUCTOR ALLOYS;

CAPACITANCE; CONCENTRATION (PROCESS); FERROMAGNETIC MATERIALS; FERROMAGNETISM; GALLIUM ALLOYS; HALL EFFECT; MANGANESE; THERMAL NOISE;

HOLE CONCENTRATION;

EID: 79956054166     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1496143     Document Type: Article

References (13)

1. H. Ohno, Science 281, 951 (1998). sci SCIEAS 0036-8075
2. H. Ohno, J. Magn. Magn. Mater. 200, 110 (1999), and references therein. jmm JMMMDC 0304-8853
3. S. J. Potashnik, K. C. Ku, S. H. Chun, J. J. Berry, N. Samarth, and P. Schiffer, Appl. Phys. Lett. 79, 1495 (2001). apl APPLAB 0003-6951
4. K. M. Yu, W. Walukiewicz, T. Wojtowicz, I. Kuryliszyn, X. Liu, Y. Sasaki, and J. K. Furdyna, Phys. Rev. B 65, R201303 (2002). prb PRBMDO 0163-1829
5. T. Dietl, H. Ohno, F. Matsukura, J. Cibert, and D. Ferrand, Science 287, 1019 (2000). sci SCIEAS 0036-8075
6. L. Van Bockstal, A. Van Esch, R. Bogaerts, F. Herlach, A. van Steenbergen, J. D. Boeck, and G. Borghs, Physica B 246-247, 258 (1998). phb PHYBE3 0921-4526
7. C. M. Hurd, in The Hall Effect and Its Applications, edited by C. L. Chienand and C. W. Westgate (Plenum, New York, 1980), pp. 43-51.
8. H. Ohno, F. Matsukura, T. Omiya, and N. Akiba, J. Appl. Phys. 85, 4277 (1999). jap JAPIAU 0021-8979
9. For a review of the ECV method see, e.g., P. Blood, Semicond. Sci. Technol. 1, 7 (1986). sst SSTEET 0268-1242
10. M. Kaminska, Z. Liliental-Weber, E. R. Weber, T. George, J. B. Kortright, F. W. Smith, B. Y. Tsaur, and A. R. Calawa, Appl. Phys. Lett. 54, 1881 (1989). apl APPLAB 0003-6951
11. D. E. Bliss, W. Walukiewicz, J. W. Ager III, E. E. Haller, K. T. Chan, and S. Tanigawa, J. Appl. Phys. 71, 1699 (1992). jap JAPIAU 0021-8979
12. T. Wojtowicz (unpublished).
13. E. R. Weber, H. Ennen, U. Kaufmann, J. Windscheif, J. Schneider, and T. Wosinski, J. Appl. Phys. 53, 6140 (1982). jap JAPIAU 0021-8979