Electrical conductivity and thermopower of Cu-SiO2 nanogranular films

Applied Physics Letters

Volumn 81, Issue 3, 2002, Pages 523-525

  Chen, W ^a   Lin, J J ^b   Zhang, X X ^c   Shin, H K ^d   Dyck, J S ^a   Uher, C ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^c HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

^d Ajou University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRICAL CONDUCTIVITY; LINEAR TEMPERATURE DEPENDENCE; LOW TEMPERATURES; NANOGRANULAR FILMS; TEMPERATURE DEPENDENCE;

ELECTRIC CONDUCTIVITY; ELECTRON-ELECTRON INTERACTIONS; METAL INSULATOR BOUNDARIES; METAL INSULATOR TRANSITION; SEMICONDUCTOR INSULATOR BOUNDARIES; SILICON COMPOUNDS; TEMPERATURE DISTRIBUTION;

COPPER;

EID: 79956038742     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1493668     Document Type: Article

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