Nanoscale modification of optical properties in Ge-doped SiO2 glass by electron-beam irradiation

Applied Physics Letters

Volumn 80, Issue 11, 2002, Pages 2005-2007

  Jiang, Nan ^a   Qiu, Jianrong ^a   Gaeta, Alexander L ^a   Silcox, John ^a  

^a Cornell University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM WRITING; ELECTRON-BEAM IRRADIATIONS; HIGH-ENERGY ELECTRON IRRADIATION; NANO-METER-SCALE; NANOSCALE MODIFICATIONS; RAPID DECOMPOSITION;

CHEMICAL MODIFICATION; ELECTRONS; GERMANIUM; GLASS; IRRADIATION; SILICON COMPOUNDS;

OPTICAL PROPERTIES;

EID: 79956015672     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1454211     Document Type: Article

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