Magnetic and electrical properties of Co2MnGa grown on GaAs (001)

Applied Physics Letters

Volumn 81, Issue 9, 2002, Pages 1651-1653

  Holmes, S N ^a   Pepper, M ^a,b  

^a TOSHIBA CORPORATION   (Japan)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC MAGNETORESISTANCE; BULK RESISTIVITY; DISORDERED ALLOY; EASY AXIS; ESSENTIAL COMPONENT; GAAS(001); HEUSLER ALLOYS; IN-PLANE; MAGNETIC AND ELECTRICAL PROPERTIES; RESIDUAL RESISTIVITY RATIOS; SEMICONDUCTING BEHAVIOR; SPIN INJECTION; SPIN-ORBIT SCATTERING; SPIN-POLARIZED BAND; UNIAXIAL ANISOTROPY; WAFER THICKNESS;

ANISOTROPY; CARBON DIOXIDE; ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; FERROMAGNETIC MATERIALS; FERROMAGNETISM; GALLIUM ARSENIDE; HYBRID MATERIALS; MAGNETIC PROPERTIES; SEMICONDUCTING GALLIUM; SEMICONDUCTOR DEVICES; SILICON WAFERS;

GALLIUM ALLOYS;

EID: 79956015176     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1503405     Document Type: Article

References (13)

1. S. Fujii, S. Sugimura, S. Ishida, and S. Asano, J. Phys.: Condens. Matter 2, 8583 (1990). jcz JCOMEL 0953-8984
2. R. A. de Groot, F. M. Mueller, P. G. van Engen, and K. H. J. Buschow, Phys. Rev. Lett. 50, 2024 (1983). prl PRLTAO 0031-9007
3. G. Schmidt, D. Ferrand, L. W. Molenkamp, A. T. Filip, and B. J. van Wees, Phys. Rev. B 62, R4790 (2000). prb PRBMDO 0163-1829
4. P. R. Hammar, B. R. Bennett, M. J. Yang, and M. Johnson, Phys. Rev. Lett. 83, 203 (1999). prl PRLTAO 0031-9007
5. S. Gardelis, C. G. Smith, W. Y. Lee, C. H. W. Barnes, E. H. Linfield, D. A. Ritchie, and J. A. C. Bland, Physica E 6, 718 (2000). 2by PELNFM 1386-9477
6. J. Q. Xie, J. W. Dong, J. Lu, C. J. Palmstrom, and S. McKernan, Appl. Phys. Lett. 79, 1003 (2001). apl APPLAB 0003-6951
7. T. Ambrose, J. J. Krebs, and G. Prinz, Appl. Phys. Lett. 76, 3280 (2000). apl APPLAB 0003-6951
8. W. Van Roy, J. DeBoeck, B. Brijs, and G. Borghs, Appl. Phys. Lett. 77, 4190 (2000). apl APPLAB 0003-6951
9. S. N. Holmes and R. F. Lee (in preparation).
10. K. Fuchs Proc. Camb. Phil. Soc. 34, 100 (1938); pcx PCPSA4 0068-6735
11. E. H. Sondheimer, Adv. Phys. 1, 1 (1952). adp ADPHAH 0001-8732
12. Y. B. Xu, E. T. M. Kernohan, D. J. Freeland, A. Ercole, M. Tselepi, and J. A. C. Bland, Phys. Rev. B 58, 890 (1998). prb PRBMDO 0163-1829
13. J. W. Dong, L. C. Chen, C. J. Palmstrom, R. D. James, and S. McKernan, Appl. Phys. Lett. 75, 1443 (1999). apl APPLAB 0003-6951