Fast time-resolved x-ray diffraction in BaTiO3 films subjected to a strong high-frequency electric field

Applied Physics Letters

Volumn 80, Issue 17, 2002, Pages 3159-3161

  Zolotoyabko, E ^a   Quintana, J P ^b   Hoerman, B H ^c   Wessels, B W ^c  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^b NORTHWESTERN UNIVERSITY   (United States)

^c Northwestern University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED PHOTON SOURCE; ARGONNE NATIONAL LABORATORY; DIFFRACTION PROFILES; DYNAMIC STRUCTURAL RESPONSE; HIGH FREQUENCY ELECTRIC FIELDS; IN-SITU; TIME-DEPENDENT; TIME-RESOLVED X-RAY DIFFRACTION; X-RAY BURSTS; X-RAY DIFFRACTION MEASUREMENTS;

ELECTRIC FIELDS; FERROELECTRIC FILMS; X RAY DIFFRACTION;

BARIUM COMPOUNDS;

EID: 79956004785     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1476057     Document Type: Article

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