![]() |
Volumn 40, Issue 5, 2011, Pages 635-640
|
Deposition of nanocrystalline Bi 2Te 3 films using a modified MOCVD system
|
Author keywords
Bi 2Te 3; MOCVD; nanocrystallite; thermoelectric
|
Indexed keywords
BI 2TE 3;
GAAS SUBSTRATES;
GAS-PHASE REACTIONS;
GROWTH PARAMETERS;
METALORGANIC CHEMICAL VAPOR DEPOSITION;
MIXING ROOMS;
MOCVD;
NANO-SIZE;
NANOCRYSTALLINES;
NANOSTRUCTURED FILMS;
SMALL PARTICLES;
SUSCEPTORS;
THERMOELECTRIC;
THERMOELECTRIC FILM;
TOP-DOWN METHODS;
CRYSTALLITES;
GALLIUM ALLOYS;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
NANOPARTICLES;
PHASE INTERFACES;
SUBSTRATES;
BISMUTH;
|
EID: 79955901629
PISSN: 03615235
EISSN: None
Source Type: Journal
DOI: 10.1007/s11664-010-1490-z Document Type: Conference Paper |
Times cited : (17)
|
References (17)
|