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Volumn 40, Issue 5, 2011, Pages 635-640

Deposition of nanocrystalline Bi 2Te 3 films using a modified MOCVD system

Author keywords

Bi 2Te 3; MOCVD; nanocrystallite; thermoelectric

Indexed keywords

BI 2TE 3; GAAS SUBSTRATES; GAS-PHASE REACTIONS; GROWTH PARAMETERS; METALORGANIC CHEMICAL VAPOR DEPOSITION; MIXING ROOMS; MOCVD; NANO-SIZE; NANOCRYSTALLINES; NANOSTRUCTURED FILMS; SMALL PARTICLES; SUSCEPTORS; THERMOELECTRIC; THERMOELECTRIC FILM; TOP-DOWN METHODS;

EID: 79955901629     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-010-1490-z     Document Type: Conference Paper
Times cited : (17)

References (17)
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  • 4
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  • 6
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    • DOI 10.1038/35098012
    • R Venkatasubramanian E Siivola T Colpitts B O'quinn 2001 Nature 413 597 10.1038/35098012 1:CAS:528:DC%2BD3MXnslehtLs%3D (Pubitemid 32964053)
    • (2001) Nature , vol.413 , Issue.6856 , pp. 597-602
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    • Kwon, S.-D.1    Kim, J.-S.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.