Preparation of γ-Bi2MoO6 thin films by thermal evaporation deposition and characterization for photocatalytic applications

Catalysis Today

Volumn 166, Issue 1, 2011, Pages 140-145

  Cuéllar, E López ^a   Martinez De La Cruz A ^a   Rodríguez, K H Lozano ^a   Méndez, U Ortiz ^a  

^a UNIVERSIDAD AUTÓNOMA DE NUEVO LEÓN   (Mexico)

Author keywords

Photocatalysis; Photosensitization; Thermal evaporation; Thin film

Indexed keywords

BINARY ALLOYS; BISMUTH ALLOYS; DEPOSITION RATES; FILM PREPARATION; FILM THICKNESS; PHOTOCATALYSIS; PHOTODEGRADATION; THERMAL EVAPORATION;

ATMOSPHERIC OXYGEN; PHOTOCATALYTIC ACTIVITIES; PHOTOCATALYTIC APPLICATION; PHOTOSENSITIZATION; SEQUENTIAL PROCESS; THERMAL EVAPORATION DEPOSITION; THERMAL EVAPORATION SYSTEMS; VISIBLE-LIGHT IRRADIATION;

THIN FILMS;

EID: 79955891364     PISSN: 09205861     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cattod.2010.05.005     Document Type: Conference Paper

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