Electronic origins for sulfur interactions with palladium alloys for hydrogen-selective membranes

Journal of Membrane Science

Volumn 375, Issue 1-2, 2011, Pages 96-103

  Opalka, Susanne M ^a   Løvvik, Ole M ^b,c   Emerson, Sean C ^a   She, Ying ^a   Vanderspurt, Thomas H ^a  

^a UNITED TECHNOLOGIES RESEARCH CENTER   (United States)

^b SINTEF MATERIALS AND CHEMISTRY   (Norway)

^c UNIVERSITY OF OSLO   (Norway)

Author keywords

DFT; Hydrogen membrane; Pd alloys; Sulfur tolerance

Indexed keywords

ADSORPTION ENTHALPIES; ADSORPTION STRENGTH; ATOMIC MODELING; BINARY SYSTEMS; BONDING BEHAVIOR; BONDING STATE; BONDING STRENGTH; D-BAND CENTERS; DENSITY OF STATE; DFT; ELECTRONIC CHARACTERISTICS; ELECTRONIC COUPLING; ELECTRONIC ORIGIN; ENERGY DIFFERENCES; HYDROGEN MEMBRANE; HYDROGEN-SELECTIVE MEMBRANES; LINEAR CORRELATION; LOWER ENERGIES; ORBITALS; PARTIAL DESORPTION; PARTIAL INCORPORATION; PD ALLOY; REVERSIBLE ADSORPTION; SELECTIVE MEMBRANES; STABLE CONFIGURATION; SULFUR TOLERANCE; SURFACE SITES;

ADSORPTION; BINARY ALLOYS; DESORPTION; HYDROGEN; MONOLAYERS; PALLADIUM ALLOYS; SILVER ALLOYS; SULFUR;

PALLADIUM;

ALLOY; FRIEDELIN; HYDROGEN; PALLADIUM; SULFUR;

ADSORPTION; ARTICLE; CORROSION; DESORPTION; ELECTRONICS; ENERGY; ENTHALPY; NONHUMAN; PRIORITY JOURNAL; SURFACE PROPERTY;

EID: 79955855926     PISSN: 03767388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.memsci.2011.03.018     Document Type: Article

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