Processing of hollow micro- and nanostructures using the hydrophilic nature of MgO

Precision Engineering

Volumn 35, Issue 3, 2011, Pages 496-499

  Zolotaryov, A ^a   Bachmann, J ^a   Montero Moreno, J M ^a   Pitzschel, K ^a   Nielsch, K ^a  

^a UNIVERSITY OF HAMBURG   (Germany)

Author keywords

Atomic layer deposition; Heat treatment; Hollow nanostructures; Lithography

Indexed keywords

HOLLOW NANOSTRUCTURES; HOLLOW STRUCTURE; MGO SURFACES; MICRO AND NANOSTRUCTURES; NANOPATTERNED SURFACES;

ATOMIC LAYER DEPOSITION; WATER VAPOR;

NANOSTRUCTURES;

EID: 79955833541     PISSN: 01416359     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.precisioneng.2011.03.005     Document Type: Article

References (12)

1. H.-J. Freund, H. Kuhlenbeck, and V. Staemmler Rep Prog Phys 59 1996 283 347
2. H. Onishi, C. Egawa, T. Aruga, and Y. Iwasawa Surf Sci 191 1987 479 491
3. M. Komiyama, and M. Gu Appl Surf Sci 120 1997 125 128
4. M. Odelius Phys Rev B 82 1999 3919 3922
5. V.A. Tikhomorov, and K. Jug J Phys Chem 104 2000 7619 7622
6. C. Xu, and D.W. Gooman Chem Phys Lett 265 1997 341 346
7. S. Coluccia, S. Lavagnino, and L. Marchese Mater Chem Phys 18 1988 445 464
8. J. Bachmann, A. Zolotaryov, O. Albrecht, S. Goetze, D. Hesse, D. Novikov, et al. Chemical identity of nickel oxide films by atomic layer deposition, Chem Vapor Depos, submitted.
9. A. Zolotaryov, S. Goetze, R. Zierold, D. Novikov, B. Birajdar, and D. Hesse Adv Eng Mater 12 2010 509 516
10. R.L. Puurunen J Appl Phys 97 2005 121301
11. F.-H. Lu, and W.-Z. Lo J Vacuum Sci Technol A 22 2004 2071 2076
12. M.G. Allen, and S.D. Senturia J Adhesion 25 1988 303 315