Rigorous optical simulation of light management in crystalline silicon thin film solar cells with rough interface textures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7933, Issue , 2011, Pages

  Lockau, Daniel ^a,b   Zschiedrich, Lin ^c   Burger, Sven ^b,c   Schmidt, Frank ^b,c   Ruske, Florian ^a   Rech, Bernd ^a  

^a HAHN MEITNER INSTITUT   (Germany)

^b ZUSE INSTITUTE BERLIN   (Germany)

^c JCMWAVE GMBH   (Germany)

Author keywords

FEM; light trapping; optics; rough surface; silicon; simulation; thin film solar cell

Indexed keywords

FEM; LIGHT TRAPPING; ROUGH SURFACES; SIMULATION; THIN FILM SOLAR CELL;

ELECTROOPTICAL DEVICES; LIGHT; MONTE CARLO METHODS; OPTOELECTRONIC DEVICES; SAMPLING; SOLAR CELLS; TEXTURES; THIN FILMS; TRANSFER MATRIX METHOD;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 79955763959     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.874967     Document Type: Conference Paper

References (14)

1. Krč, J., Smole, F., and Topič, M., "Analysis of light scattering in amorphous Si:H solar cells by a one-dimensional semi-coherent optical model," Progress in Photovoltaics: Research and Applications 11, 15-26 (2003).
2. Bittkau, K., Beckers, T., Fahr, S., Rockstuhl, C., Lederer, F., and Carius, R., "Nanoscale investigation of light-trapping in a-Si:H solar cell structures with randomly textured interfaces," phys. stat. sol. (a) 205(12), 2766-2776 (2008).
3. Rockstuhl, C., Lederer, Bittkau, K., Beckers, T., and Carius, R., "The impact of intermediate reectors on light absorption in tandem solar cells with randomly textured surfaces," Applied Physics Letters 94, 211101 (2009).
4. Rockstuhl, C., Lederer, F., Bittkau, K., and Carius, R., "Light localization at randomly textured surfaces for solar-cell applications," Applied Physics Letters 91, 171104 (2007).
5. Agrawal, M., Frei, M., Bhatnagar, Y., Repmann, T., Witting, K., Schroeder, J., and Eberspacher, C., "Comprehensive experimental and numerical optimization of surface morphology of transparent conductive oxide films for tandem thin film photovoltaic cells," in [Photovoltaic Specialists Conference (PVSC), 2010 35th IEEE], 000301 (2010).
6. Hastings, F. D., Schneider, J. B., and Broschat, S. L., "A Monte-Carlo FDTD technique for rough surface scattering," IEEE Transactions on Antennas and Propagation 42(11), 1183 (1995).
7. Maradudin, A. A., Leskova, T. A., and Simonsen, I., "Scattering of electromagnetic waves from two-dimensional randomly rough perfectly conducting surfaces," Annual Review of Progress in Applied Computational Electromagnetics 25, 505 (2009).
8. Peng, L. and Yaqiu, J., "Numerical simulation of bistatic scattering from a target at low altitude above rough sea surface under an EM wave incidence at low grazing angle by using the finite element method," Science in China Ser. E Engineering & Materials Science 47(3), 293-304 (2004).
9. Braunisch, H., Zhang, Y., Ao, C. O., Shih, S.-E., Yang, Y. E., Ding, K.-H., Kong, J. A., and Tsang, L., "Tapered wave with dominant polarization state for all angles of incidence," IEEE Transactions on Antennas and Propagation 48(7), 1086 (2000).
10. Sontheimer, T., Becker, C., Bloeck, U., Gall, S., and Rech, B., "Crystallization kinetics in electron-beam evaporated amorphous silicon on ZnO:Al-coated glass for thin lm solar cells," Applied Physics Letters 95, 101902 (2009).
11. Kluth, O., Zahren, C., Stiebig, H., Rech, B., and Schade, H., "Surface morphologies of rough transparent conductive oxide films applied in silicon thin-film solar cells," in [Proceedings of the 19th European PVSEC], (2004).
12. Lechner, P., Geyer, R., Schade, H., Rech, B., Kluth, O., and Stiebig, H., "Optical tco properties and quantum effciencies in thin film silicon solar cells," in [Proceedings of the 19th European PVSEC], (2004).
13. Wu, J.-J., "Simulation of rough surfaces with FFT," Tribology International 33, 47-58 (2000).
14. Zschiedrich, L., Burger, S., Schädle, A., and Schmidt, F., "A rigorous finite-element domain decomposition method for electromagnetic near field simulations," in [Optical Microlithography XXI], 6924, 692450, Proc. SPIE (2008).