Modeling effects of oxygen inhibition in mask-based stereolithography

Rapid Prototyping Journal

Volumn 17, Issue 3, 2011, Pages 168-175

  Jariwala, Amit S ^a   Ding, Fei ^a   Boddapati, Aparna ^a   Breedveld, Victor ^a   Grover, Martha A ^a   Henderson, Clifford L ^a   Rosen, David W ^b  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^b Georgia Institute of Technology   (Georgia)

Author keywords

Chemical kinetics; Modelling; Oxygen; Polymerization

Indexed keywords

ACRYLATE MONOMERS; ADDITIVE MANUFACTURING PROCESS; CHEMICAL KINETICS; COMPLEX CHEMICAL REACTIONS; DESIGN/METHODOLOGY/APPROACH; EFFECT OF OXYGEN; KNOWLEDGE GAPS; LIQUID PHOTOPOLYMERS; MICRO-OPTICAL COMPONENTS; MICROSTEREOLITHOGRAPHY; MODELING EFFECTS; MODELLING; OXYGEN INHIBITION; PARAMETRIC STUDY; POLYMERIZATION REACTION; RESIN CURING; SIMULATED RESULTS; SPECIES TRANSPORT; UV LASER LIGHTS;

ACRYLIC MONOMERS; COMPUTER SIMULATION; CROSSLINKING; CURING; FORECASTING; LIGHT SOURCES; ORDINARY DIFFERENTIAL EQUATIONS; OXYGEN; PHOTOPOLYMERIZATION; RESINS;

EXPERIMENTS;

EID: 79955697843     PISSN: 13552546     EISSN: None     Source Type: Journal    
DOI: 10.1108/13552541111124734     Document Type: Article

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