Electrodeposition of Mg(OH)2 film on Tin oxide coated glass substrate at room temperature

ECS Transactions

Volumn 19, Issue 25, 2009, Pages 39-49

  Lü, Ying ^a   Lai, Yanqing ^a   Zhang, Zhian ^a   Liu, Yexiang ^a  

^a CENTRAL SOUTH UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHRONOAMPEROMETRY; CYCLIC VOLTAMMETRY; ELECTRODEPOSITION; ELECTRODES; GLASS; HYDROGEN; HYDROGEN EVOLUTION REACTION; MORPHOLOGY; NITRATES; SUBSTRATES; THIN FILMS; TIN OXIDES;

CATHODIC CURRENT DENSITY; COATED GLASS SUBSTRATES; ELECTROCHEMICAL PROCESS; EVOLUTION OF HYDROGENS; MAGNESIUM HYDROXIDE; POTENTIOSTATIC METHODS; PREFERRED ORIENTATIONS; REDUCTION OF OXYGEN;

MAGNESIUM COMPOUNDS;

EID: 79955593460     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3247064     Document Type: Conference Paper

References (23)

1. P. C. Lin, C. W. Huang, C. T. Hsiao and H. Teng, Environ Sci Technol, 42, 2748 (2008).
2. J. Lv, L. Z. Qiu and B. J. Qu, Nanotechnology, 15, 1576 (2004).
3. J. H. Yum, S. Nakade, D. Y. Kim and S. Yanagida, J Phys Chem B, 110, 3215 (2006).
4. H. Miyazaki, R. Mikami, A. Yamada and M. Konagai, Jap. J. Appl. Phys., 45, 2618 (2006).
5. A. Yamada, H. Miyazaki, Y. Chiba and M. Konagai, Thin Solid Films, 480, 503 (2005).
6. Y. D. Li, M. Sui, Y. Ding, G. H. Zhang, J. Zhuang and C. Wang, Adv Mater, 12, 818 (2000).
7. C. L. Yan, D. F. Xue, L. J. Zou, X. X. Yan and W. Wang, J Cryst Growth, 282, 448 (2005).
8. G. Z. Wang, L. Zhang, H. X. Dai, J. G. Deng, C. X. Liu, H. He and C. T. Au, Inorg Chem, 47, 4015 (2008).
9. Y. Ding, G. T. Zhang, H. Wu, B. Hai, L. B. Wang and Y. T. Qian, Chem Mater, 13, 435 (2001).
10. J. C. Yu, A. W. Xu, L. Z. Zhang, R. Q. Song and L. Wu, J Phys Chem B, 108, 64 (2004).
11. W. L. Fan, S. X. Sun, X. Y. Song, W. M. Zhang, H. Y. Yu, X. J. Tan and G. X. Cao, J Solid State Chem, 177, 2329 (2004).
12. G. Therese and P. V. Kamath, Chem Mater, 12, 1195 (2000).
13. I. Zhitomirsky, Adv Colloid Interfac, 97, 279 (2002).
14. G. H. A. Therese and P. V. Kamath, J Appl Electrochem, 28, 539 (1998).M.
15. Dinamani and P. V. Kamath, J Appl Electrochem, 34, 899 (2004).
16. G. L. Zou, W. X. Chen, R. Liu and Z. D. Xu, Mater Chem Phys, 107, 85 (2008).
17. G. L. Zou, R. Liu and W. X. Chen, Mater Lett, 61, 1990 (2007).
18. C. F. Li, W. H. Ho and S. K. Yen, J Electrochem Soc, 156, E29 (2009).
19. D. R. L. David R Lide, Handbook of Chemistry and Physics, 66th Edition, p. 2376, CRC (1985).
20. J. A. Dean, Lange's Chemistry Handbook, McGraw-Hill (1999).
21. G. G. Perrault, J Electroanal Chem, 51, 107 (1974).
22. J. Chen, J. H. Dong, J. Q. Wang, E. H. Han and W. Ke, Corros Sci, 50, 3610 (2008).
23. S. Kaneko, K. Uosaki and H. Kita,, 90, 6654 (1986).