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Journal of Applied Physics

Volumn 109, Issue 7, 2011, Pages

Epitaxial strain and antiferromagnetism in Heusler Fe2VSi thin films

(3) Fukatani, N a Ueda, K a Asano, H a

a NAGOYA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIFERROMAGNETICS; BIAXIAL STRAINS; BULK MATERIALS; ELECTRICAL AND MAGNETIC PROPERTY; EPITAXIAL STRAIN; HEUSLER; HEUSLER COMPOUND; IN-PLANE LATTICE PARAMETERS; JAHN TELLER EFFECT; MGO SUBSTRATE; OUT-OF-PLANE LATTICE PARAMETERS; ROOM TEMPERATURE; THEORETICAL PREDICTION;

ANTIFERROMAGNETIC MATERIALS; ELECTRIC PROPERTIES; EPITAXIAL GROWTH; FERROMAGNETISM; LATTICE CONSTANTS; LATTICE MISMATCH; MAGNETIC PROPERTIES; NEEL TEMPERATURE; SUBSTRATES; THIN FILMS;

STRAIN;

EID: 79955448114 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3555089 Document Type: Conference Paper

Times cited : (19)

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