A simple cost-effective sputtering-based method for micropatterning and materials microstructuring

Journal of Nanoscience and Nanotechnology

Volumn 10, Issue 9, 2010, Pages 6190-6194

  Poulopoulos, Panagiotis ^a   Kapaklis, Vassilios ^a,b   Pappas, Spiridon D ^a   Trachylis, Dimitrios ^a   Politis, Constantin ^a  

^a UNIVERSITY OF PATRAS   (Greece)

^b UPPSALA UNIVERSITY   (Sweden)

Author keywords

Cobalt; Copper; Micropatterning; Microstructuring; Platinum; Porous Silicon; Silicon; Sputtering; Thin Films

Indexed keywords

COST-EFFECTIVE METHODS; ETCHING PROCESS; GRID SIZE; HIGH ENERGY; HIGH VACUUM; LASER-ASSISTED; MAGNETIC FORCE; MAGNETIC SIGNALS; MAGNETO-OPTIC KERR EFFECT; METALLIC GRID; MICROCOLUMNS; MICROPATTERNING; MICROSTRUCTURING; MODERN TECHNOLOGIES; PATTERNED MATERIALS; PT FILMS; RADIO FREQUENCIES; SILICON NETWORKS; SPUTTERING CONDITIONS; SPUTTERING POWER;

ATOMIC FORCE MICROSCOPY; COBALT; COPPER; COST EFFECTIVENESS; HIGH ENERGY PHYSICS; KERR MAGNETOOPTICAL EFFECT; MAGNETISM; MAGNETOMETERS; MAGNETRONS; MICROSTRUCTURE; PLATINUM; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; THIN FILMS;

POROUS SILICON;

EID: 79955427414     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2010.2592     Document Type: Conference Paper

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