Plasma surface treatments of TiO2 photoelectrodes for use in dye-sensitized solar cells

Journal of the Electrochemical Society

Volumn 158, Issue 4, 2011, Pages

  Wu, Wan Yu ^a   Shih, Tzu Wen ^a   Chen, Peter ^b   Ting, Jyh Ming ^a   Chen, Jin Ming ^b  

^a MINGDAO UNIVERSITY   (Taiwan)

^b NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANATASE TIO; BONDING RATIO; CELL EFFICIENCY; DYE ABSORPTION; DYE-SENSITIZED SOLAR CELL; MESOPOROUS TIO; METHANE PLASMA; NITROGEN PLASMA TREATMENT; OXYGEN PLASMA TREATMENTS; PHOTO-ELECTRODES; PHOTOELECTRODE; PLASMA SURFACE TREATMENT; SINGLE-CRYSTALLINE; SINTERED SAMPLES; TIO; X-RAY ABSORPTION NEAR-EDGE STRUCTURE;

ABSORPTION; ABSORPTION SPECTROSCOPY; CONVERSION EFFICIENCY; EFFICIENCY; METHANE; NITROGEN; NITROGEN PLASMA; OXYGEN; OXYGEN VACANCIES; PHOTOELECTROCHEMICAL CELLS; PHOTONS; PLASMA APPLICATIONS; SINTERING; SOLAR CELLS; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

SURFACE TREATMENT;

EID: 79955133419     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3547725     Document Type: Article

References (33)

1. B. O'Regan and M. Grtzel, Nature, 353, 737 (1991). 10.1038/353737a0 (Pubitemid 21738149)
2. A. Hippel, J. Kalnajs, and W. B. Westphal, J. Phys. Chem. Solids, 23, 779 (1962). 10.1016/0022-3697(62)90536-X
3. V. E. Henrich and R. L. Kurts, Phys. Rev. B, 23, 6280 (1981). 10.1103/PhysRevB.23.6280
4. J. Nelson, Phys. Rev. B, 59, 15374 (1999). 10.1103/PhysRevB.59.15374
5. P. E. Jongh and D. Vanmaekelbergh, J. Phys. Chem. B, 101, 2716 (1997). 10.1021/jp962226n
6. H. Wang, J. He, G. Boschloo, H. Lindstrm, A. Hagfeldt, and S.-E. Lindquist, J. Phys. Chem. B, 105, 2529 (2001). 10.1021/jp0036083 (Pubitemid 35372832)
7. L. N. Lewis, J. L. Spivack, S. Gasaway, E. D. Williams, J. Y. Gui, V. Manivannan, and O. P. Siclovan, Sol. Energy Mater. Sol. Cells, 90, 1041 (2006). 10.1016/j.solmat.2005.05.019 (Pubitemid 43290575)
8. J. Weidmann, T. Dittrich, E. Konstantinova, I. Lauermann, I. Uhlendorf, and F. Koch, Sol. Energy Mater. Sol. Cells, 56, 153 (1999).
9. T. Ma, M. Akiyama, E. Abe, and I. Imai, Nano Lett., 5, 2543 (2005). 10.1021/nl051885l (Pubitemid 43088909)
10. K.-H. Park and M. Dhayal, Electrochem. Commun., 11, 75 (2009). 10.1016/j.elecom.2008.10.020
11. Y.-S. Kim, C.-H. Yoon, K.-J. Kim, and Y.-H. Lee, J. Vac. Sci. Technol. A, 25, 1219 (2007). 10.1116/1.2742392 (Pubitemid 47142966)
12. Y.-S. Kim, B.-J. Yoo, R. Vittal, Y.-H. Lee, N.-G. Park, and K.-J. Kim, J. Power Sources, 175, 914 (2008). 10.1016/j.jpowsour.2007.09.112 (Pubitemid 350213303)
13. T. Yuji and Y. M. Sung, IEEE Trans. Plasma Sci., 35, 1010 (2007). 10.1109/TPS.2007.896918 (Pubitemid 47322962)
14. B.-K. Lee and J.-J. Kim, Curr. Appl. Phys., 9, 404 (2009. 10.1016/j.cap.2008.03.017
15. S. O. Kucheyev, T. van Buuren, T. F. Baumann, J. H. Satcher, Jr., T. M. Willey, R. W. Meulenberg, T. E. Felter, J. F. Poco, S. A. Gammon, and L. J. Terminello, Phys. Rev. B, 69, 245102 (2004). 10.1103/PhysRevB.69.245102
16. H. C. Choi, H. J. Ahn, Y. M. Jung, M. K. Lee, H. J. Shin, S. B. Kim, and Y.E. Sung, Appl. Spectrosc., 58, 5 (2004). 10.1366/000370204774103435
17. S. J. Stewart, M. F. Garca, C. B. Belver, S. Mun, F. G. Requejo, Phys. Chem. B, 110, 16482 (2006). 10.1021/jp0624451 (Pubitemid 44373372)
18. H.-C. Choi, H.-J. Ahn, Y.-M. Jung, M.-K. Lee, H.-J. Shin, S. B. Kim, and Y.-E. Sung, Appl. Spectrosc., 58, 598 (2004). 10.1366/000370204774103435
19. F. M. F. de Groot, J. Faber, J. J. M. Michiels, M. T. Czyzyk, M. Abbate, and J. C. Fuggle, Phys. Rev. B, 48, 2074 (1993). 10.1103/PhysRevB.48.2074
20. V. S. Lusvardi, M. A. Barteau, J. G. Chen, Jr., J. Eng, B. Fruhberger, and A. Teplyakov, Surf. Sci., 397, 237 (1998). 10.1016/S0039-6028(97)00740-1
21. J. F. Moulder, W. F. Stickle, P. E. Sobol, and K. D. Bomben, Handbook of X-ray Photoelectron Spectroscopy, J. Chastain, Editor, Physical Electronics, Eden Prairie (1992).
22. P. Merel, M. Tabbal, M. Chaker, S. Moisa, and J. Margot, Appl. Surf. Sci., 136, 105 (1998). 10.1016/S0169-4332(98)00319-5
23. M. K. Nazeeruddin, R. Humphry-Baker, P. Liska, and M. Gratzel, J. Phys. Chem. B, 107, 8981 (2003). 10.1021/jp022656f
24. A. J. Frank, N. Kopidakis, and J. van de Lagemaat, Coord. Chem. Rev., 248, 1165 (2004). 10.1016/j.ccr.2004.03.015
25. N. C. Saha and H. G. Tompkins, J. Appl. Phys., 72, 3072 (1992). 10.1063/1.351465
26. N. D. Shinn and K. L. Tsang, J. Vac. Sci. Technol. A, 8, 2449 (1990). 10.1116/1.576713
27. M. C. Yang, T. S. Yang, and M. S. Wong, Thin Solid Films, 469-470 -, 1 (2004).
28. R. Asahi, T. Morikawa, T. Ohwaki, K. Aoki, Y. Taga, Science, 293, 269 (2001). 10.1126/science.1061051 (Pubitemid 32694736)
29. X. B. Chen and C. Burda, J. Phys. Chem. B, 108, 15446 (2004). 10.1021/jp0469160
30. A. O. T. Patrocinio, E. B. Paniago, R. M. Paniago, and N. Y. M. Iha, Appl. Surf. Sci., 254, 1874 (2008). 10.1016/j.apsusc.2007.07.185 (Pubitemid 350296433)
31. J.-H. Yum, P. Chen, M. Grtzel, and M. K. Nazeeruddin, ChemSusChem, 1, 699 (2008). 10.1002/cssc.200800084
32. J. Pereira, I. G. Grenier, V. M. Guilbaud, A. Plain, and V. Fernandez, Surf. Coat. Technol. 200, 6414 (2006). 10.1016/j.surfcoat.2005.11.004 (Pubitemid 44307865)
33. S. Sun, L. Gao, and Y. Liu, Appl. Phys. Lett., 96, 083113 (2010). 10.1063/1.3318466