Two-dimensional nanoparticle self-assembly using plasma-induced Ostwald ripening

Nanotechnology

Volumn 22, Issue 23, 2011, Pages

  Tang, J ^a,d   Photopoulos, P ^a,b   Tserepi, A ^c   Tsoukalas, D ^a,c  

^a NATIONAL TECHNICAL UNIVERSITY OF ATHENS   (Greece)

^b UNIVERSITY OF WEST ATTICA   (Greece)

^c INSTITUTE OF MICROELECTRONICS   (Greece)

^d NORTH UNIVERSITY OF CHINA   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AG NANOPARTICLE; AR PLASMA TREATMENT; DC MAGNETRON SPUTTERING; DIFFERENT SIZES; NANOPARTICLE DENSITY; NANOPARTICLE SELF-ASSEMBLY; PARTICLE DENSITIES; PLASMA TREATMENT; PLASMA-INDUCED; POTENTIAL APPLICATIONS; RAPID METHOD; RIPENING PROCESS; SI SUBSTRATES;

BIOSENSORS; NANOPARTICLES; OSTWALD RIPENING; PHOSPHORUS; PLASMA APPLICATIONS; PLASMAS; SELF ASSEMBLY; TWO DIMENSIONAL;

SILVER;

EID: 79954603142     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/22/23/235306     Document Type: Article

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