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Journal of Materials Science: Materials in Electronics

Volumn 22, Issue 5, 2011, Pages 474-480

Epitaxial growth mechanism of La 2Zr 2O 7 thin film on metal substrate

(9) Wang, Y a,b Zhou, L a,b Lu, Y F b Li, C S b Yu, Z M b Li, J S a Jin, L H b Zhang, Y c Shen, Y c

a NORTHWESTERN POLYTECHNICAL UNIVERSITY (China)

b NORTHWEST INSTITUTE FOR NONFERROUS METAL RESEARCH (China)

c SHAANXI NORMAL UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

BIAXIAL TEXTURES; COATED CONDUCTORS; DIFFERENT THICKNESS; GROWTH BEHAVIOR; HIGH TEMPERATURE SUPERCONDUCTING; HYDROGEN ATMOSPHERE; LAYER FORMATION; METAL ORGANIC DEPOSITION; METAL SUBSTRATE; NUCLEATION AND GROWTH; OXIDE THIN FILMS; PREPARATION CONDITIONS; PYROCHLORE STRUCTURES; SEM; STRUCTURE AND MORPHOLOGY; SUBSTRATE SURFACE; SURFACE COVERAGES; TEXTURE DEVELOPMENT;

CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); DEPOSITION; EPITAXIAL GROWTH; HIGH TEMPERATURE SUPERCONDUCTORS; LANTHANUM; METALS; MORPHOLOGY; OXIDE FILMS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SUPERCONDUCTING FILMS; SURFACE MORPHOLOGY; TEXTURES; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZIRCONIUM;

FILM PREPARATION;

EID: 79954434104 PISSN: 09574522 EISSN: 1573482X Source Type: Journal
DOI: 10.1007/s10854-010-0162-3 Document Type: Article

Times cited : (3)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.