Plasma wave propagation with a plasma density gradient

Physics of Plasmas

Volumn 18, Issue 3, 2011, Pages

  Cho, Guangsup ^a   Choi, Eun Ha ^a   Uhm, Han Sup ^a  

^a Kwangwoon University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC VELOCITY; ELECTRON OSCILLATIONS; ELECTRON WAVE; GROUP VELOCITIES; LONG TUBES; LOW FREQUENCY; OPERATING FREQUENCY; PLASMA DENSITY GRADIENT; PLASMA DIFFUSION; POSITIVE COLUMN;

ACOUSTIC WAVE PROPAGATION; FLUORESCENCE; FLUORESCENT LAMPS; ION ACOUSTIC WAVES; LIGHTING; MAGNETOHYDRODYNAMICS; PLASMA DENSITY; PLASMA JETS; PLASMA WAVES; PLASMAS;

ELECTROMAGNETIC WAVE PROPAGATION IN PLASMA;

EID: 79953658246     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3570651     Document Type: Article

References (29)

1. J. Waymouth, Electrical Discharge Lamps (MIT Press, Cambridge, 1971), p. 3.
2. G. S. Cho, S. H. Ahn, and J. M. Jeong, J. Phys. D 0022-3727 40, 3945 (2007). 10.1088/0022-3727/40/13/006 (Pubitemid 47134598)
3. G. S. Cho, J. H. Kim, J. M. Jeong, E. H. Choi, J. Verboncoeur, and H. S. Uhm, Appl. Phys. Lett. 0003-6951 92, 021502 (2008). 10.1063/1.2832669
4. J. H. Kim, J. Jeong, D. Jin, G. Kwon, E. H. Choi, G. Cho, and H. S. Uhm, J. Phys. D 0022-3727 42, 1 (2009).
5. G. Cho, J. Kim, J. Jeong, H. Hwang, D. Jin, J. Koo, E. H. Choi, J. P. Verboncoeur, and H. S. Uhm, IEEE Trans. Plasma Sci. 0093-3813 37, 438 (2009). 10.1109/TPS.2008.2004622
6. J. M. Jeong, J. H. Kim, H. Hwang, D. Jin, J. Koo, E. H. Choi, J. P. Verboncoeur, H. S. Uhm, and G. S. Cho, Jpn. J. Appl. Phys. 0021-4922 49, 026001 (2010). 10.1143/JJAP.49.026001
7. Francis F. Chen, Introduction to Plasma Physics and Controlled Fusion, 2nd ed. (Plenum, New York, 1984), p. 13.
8. Y. Raizer, Gas Discharge Physics (Springer-Verlag, Berlin, 1991), p. 32.
9. J. Kim and G. Cho, J. Korean Phys. Soc. 55, L1323 (2009). 10.3938/jkps.55.1404
10. R. N. Franklin, Plasma Phenomena in Gas Discharges (Oxford University Press, New York, 1976), pp. 112 and 138.
11. M. Lieberman and A. Lichtenberg, Principles of Plasma Discharges and Materials Processing, 2nd ed. (Wiley, New York, 2005), p. 334. 10.1002/0471724254
12. E. Nasser, Fundamentals of Gaseous Ionization and Plasma Electronics (Wiley, New York, 1970), p. 183.
13. E. Nasser, Fundamentals of Gaseous Ionization and Plasma Electronics (Wiley, New York, 1970), Chap., p. 112, and Appendix D, p. 448.
14. A. von Engel, Ionied Gases, 2nd ed. (Oxford University Press, New York, 1965), p. 122.
15. B. Cherrington, Gaseous Electronics and Gas Lasers (Pergamon, New York, 1979), p. 149.
16. B. Cherrington, Gaseous Electronics and Gas Lasers (Pergamon, New York, 1979), p. 116.
17. A. Salop and H. H. Nakano, Phys. Rev. A 1050-2947 2, 127 (1970). 10.1103/PhysRevA.2.127
18. L. Colli and U. Facchini, Rev. Sci. Instrum. 0034-6748 23, 39 (1952). 10.1063/1.1746063
19. D. Jin, J. Jeong, J. Kim, H. Hwang, J. Chung, Y. Cho, H. Kim, E. H. Choi, G. Cho, J. Kim, and G. Cho, J. Korean Phys. Soc. 19, 36 (2010).
20. S. C. Brown, Basic Data of Plasma Physics (MIT, Cambridge, 1959).
21. M. A. Biondi and L. M. Chanin, Phys. Rev. 0031-899X 94, 910 (1954). 10.1103/PhysRev.94.910
22. J. A. Hornbeck, Phys. Rev. 0031-899X 84, 615 (1951). 10.1103/PhysRev.84. 615
23. X. P. Lu and M. Laroussi, J. Appl. Phys. 0021-8979 100, 063302 (2006). 10.1063/1.2349475 (Pubitemid 44496079)
24. M. Laroussi and T. Akan, Plasma Processes Polym. 1612-8850 4, 777 (2007). 10.1002/ppap.200700066
25. N. Mericam-Bourdet, M. Laroussi, A. Begum, and E. Karakas, J. Phys. D 0022-3727 42, 055207 (2009). 10.1088/0022-3727/42/5/055207
26. X. Lu, Q. Xiong, Z. Xiong, J. Hu, F. Zhou, W. Gong, Y. Xian, C. Zou, Z. Tang, Z. Jiang, and Y. Pan, J. Appl. Phys. 0021-8979 105, 043304 (2009). 10.1063/1.3079503
27. S. J. Kim, T. H. Chung, and S. H. Bae, Phys. Plasmas 1070-664X 17, 053504 (2010). 10.1063/1.3400220
28. Y. Sakiyama, D. Graves, J. Jarrige, and M. Laroussi, Appl. Phys. Lett. 0003-6951 96, 041501 (2010). 10.1063/1.3298639
29. E. Robert, E. Barbosa, S. Dozias, M. Vandamme, C. Cachoncinlle, R. Viladrosa, and J. M. Pouvesle, Plasma Processes Polym. 1612-8850 6, 795 (2009).