|
Volumn 26, Issue 1, 2011, Pages 10-14
|
Simulation of plasma potential and ion energies in magnetron sputtering
|
Author keywords
High performance computing; Ion energy distribution function; Magnetron sputtering; Parallel computing; Particle in cell Monte Carlo simulation; Plasma simulation
|
Indexed keywords
COATED PRODUCTS;
CROSS-SECTIONAL MODELS;
CRYSTALLINE STRUCTURE;
ELECTRIC POTENTIAL DISTRIBUTION;
ELECTRIC POWER;
ENERGY DISTRIBUTIONS;
GROWTH CONDITIONS;
HIGH PERFORMANCE COMPUTING;
IN-LINE;
ION CREATION;
ION ENERGIES;
ION ENERGY DISTRIBUTION FUNCTION;
ION ENERGY DISTRIBUTION FUNCTIONS;
ION ENERGY DISTRIBUTIONS;
MAGNETRON SPUTTER;
MAGNETRON SPUTTERING PROCESS;
MONTE CARLO;
OPERATION MODE;
PARALLEL COMPUTING;
PARTICLE-IN-CELL;
PARTICLE-IN-CELL MONTE-CARLO SIMULATION;
PLASMA POTENTIAL;
POWER SUPPLY;
PROPERTIES OF DEPOSITED FILMS;
REACTIVE MAGNETRON SPUTTERING;
RF MODE;
SIMULATION DATA;
SIMULATION-BASED;
COMPUTER SIMULATION;
COMPUTER SOFTWARE SELECTION AND EVALUATION;
DC POWER TRANSMISSION;
ELECTRIC POTENTIAL;
ELECTRIC POWER DISTRIBUTION;
FILM GROWTH;
ION BEAMS;
IONS;
MAGNETRON SPUTTERING;
PARALLEL ARCHITECTURES;
PLASMA SIMULATION;
PLASMA SOURCES;
DISTRIBUTION FUNCTIONS;
|
EID: 79953207381
PISSN: 10667857
EISSN: None
Source Type: Journal
DOI: 10.1179/175355511X12941605982028 Document Type: Article |
Times cited : (14)
|
References (10)
|