메뉴 건너뛰기




Volumn 26, Issue 1, 2011, Pages 10-14

Simulation of plasma potential and ion energies in magnetron sputtering

Author keywords

High performance computing; Ion energy distribution function; Magnetron sputtering; Parallel computing; Particle in cell Monte Carlo simulation; Plasma simulation

Indexed keywords

COATED PRODUCTS; CROSS-SECTIONAL MODELS; CRYSTALLINE STRUCTURE; ELECTRIC POTENTIAL DISTRIBUTION; ELECTRIC POWER; ENERGY DISTRIBUTIONS; GROWTH CONDITIONS; HIGH PERFORMANCE COMPUTING; IN-LINE; ION CREATION; ION ENERGIES; ION ENERGY DISTRIBUTION FUNCTION; ION ENERGY DISTRIBUTION FUNCTIONS; ION ENERGY DISTRIBUTIONS; MAGNETRON SPUTTER; MAGNETRON SPUTTERING PROCESS; MONTE CARLO; OPERATION MODE; PARALLEL COMPUTING; PARTICLE-IN-CELL; PARTICLE-IN-CELL MONTE-CARLO SIMULATION; PLASMA POTENTIAL; POWER SUPPLY; PROPERTIES OF DEPOSITED FILMS; REACTIVE MAGNETRON SPUTTERING; RF MODE; SIMULATION DATA; SIMULATION-BASED;

EID: 79953207381     PISSN: 10667857     EISSN: None     Source Type: Journal    
DOI: 10.1179/175355511X12941605982028     Document Type: Article
Times cited : (14)

References (10)
  • 1
    • 0000139470 scopus 로고    scopus 로고
    • Al-doped zinc oxide films deposited by simultaneous rf and dc excitation of a magnetron plasma: Relationships between plasma parameters and structural and electrical film properties
    • R. Cebulla, R. Wendt and K. Ellmer: 'Al-doped zinc oxide films deposited by simultaneous RF and DC excitation of a magnetron plasma - Relationships between plasma parameters and structural and electrical film properties', J. Appl. Phys., 1998, 83, (2), 1087-1095. (Pubitemid 128600461)
    • (1998) Journal of Applied Physics , vol.83 , Issue.2 , pp. 1087-1095
    • Cebulla, R.1    Wendt, R.2    Ellmer, K.3
  • 2
    • 0000484851 scopus 로고    scopus 로고
    • Large-scale antireflective coatings on glass produced by reactive magnetron sputtering
    • PII S0257897297001515
    • J. Szczyrbowski, G. Bräuer, G. Teschner and A. Zmelty: 'Largescale antireflective coatings on glass produced by reactive magnetron sputtering', Surf. Coat. Technol., 1998, 98, 1460-1466. (Pubitemid 128397097)
    • (1998) Surface and Coatings Technology , vol.98 , Issue.1-3 , pp. 1460-1466
    • Szczyrbowski, J.1    Brauer, G.2    Teschner, G.3    Zmelty, A.4
  • 3
    • 84902437525 scopus 로고
    • Cross Sections and Swarm Coefficients for Nitrogen Ions and Neutrals in N2 and Argon Ions and Neutrals in Ar for Energies from 0.1 eV to 10 keV
    • A. V. Phelps: 'Cross Sections and Swarm Coefficients for Nitrogen Ions and Neutrals in N2 and Argon Ions and Neutrals in Ar for Energies from 0.1 eV to 10 keV', J. Phys. Chem. Ref. Data, 1991, 20, 557.
    • (1991) J. Phys. Chem. Ref. Data , vol.20 , pp. 557
    • Phelps, A.V.1
  • 6
    • 77954120044 scopus 로고    scopus 로고
    • Design tools and simulations for plasma processing in large area coaters
    • Santa Clara, CA, USA, May, SVC
    • A. Pflug,M. Siemers and B. Szyszka: 'Design tools and simulations for plasma processing in large area coaters', Proc. 52nd SVC Annu. Tech. Conf. Proc., Santa Clara, CA, USA, May 2009, SVC, 364-369.
    • (2009) Proc. 52nd SVC Annu. Tech. Conf. Proc. , pp. 364-369
    • Pflug, A.1    Siemers, M.2    Szyszka, B.3
  • 8
    • 2942538004 scopus 로고    scopus 로고
    • A study of the transient plasma potential in a pulsed bi-polar dc magnetron discharge
    • J. W. Bradley, S. K. Karkari and A. Vetushka: 'A study of the transient plasma potential in a pulsed bi-polar dc magnetron discharge', Plasma Sources Sci. Technol., 2004, 13, 189-198.
    • (2004) Plasma Sources Sci. Technol. , vol.13 , pp. 189-198
    • Bradley, J.W.1    Karkari, S.K.2    Vetushka, A.3
  • 9
    • 0006710224 scopus 로고
    • Design and use of a gridded probe in a low-pressure rf argon discharge
    • S. G. Ingram, B. Annaratone and M. Ohuchi: 'Design and use of a gridded probe in a low-pressure rf argon discharge', Rev. Sci. Instrum., 1990, 61, 1883-1891.
    • (1990) Rev. Sci. Instrum. , vol.61 , pp. 1883-1891
    • Ingram, S.G.1    Annaratone, B.2    Ohuchi, M.3
  • 10
    • 0024092852 scopus 로고
    • Ion and electron energy analysis at a surface in an RF discharge
    • S. G. Ingram, N. St. J. Braithwaite: 'Ion and electron energy analysis at a surface in an RF discharge', J. Phys. D: Appl. Phys., 1988, 21, 1496-1503.
    • (1988) J. Phys. D: Appl. Phys. , vol.21 , pp. 1496-1503
    • Ingram, S.G.1    St. J Braithwaite, N.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.