Effect of SiO2 on Bi12SiO20 crystals grown by hydrothermal technology

Journal of Crystal Growth

Volumn 318, Issue 1, 2011, Pages 900-903

  He, Xiaoling ^a   Zhou, Weining ^a   Zhang, Changlong ^a   Zhou, Haitao ^a   Hu, Zhanggui ^b   Huo, Hande ^a   Zuo, Yanbin ^a   Lu, Fuhua ^a   Wang, Jinliang ^a   Qin, Shijie ^a   Li, Dongping ^a   Zhang, Haixia ^a   Chen, Yixin ^a  

^a Guilin Research Institute of Geology for Mineral Resources   (China)

^b TECHNICAL INSTITUTE OF PHYSICS AND CHEMISTRY   (China)

Author keywords

A2. Hydrothermal crystal growth; B1. Bismuth compounds; B2. Photorefractive materials

Indexed keywords

B1. BISMUTH COMPOUNDS; CUTOFF WAVELENGTHS; CZOCHRALSKI; FT-IR SPECTRUM; GROWN CRYSTALS; GROWTH TECHNOLOGIES; HYDROTHERMAL CONDITIONS; HYDROTHERMAL CRYSTAL GROWTH; HYDROTHERMAL TECHNOLOGY; NO ABSORPTION; PHOTO-REFRACTIVE; TRANSMITTANCE SPECTRA; X RAY ROCKING CURVE; XRD;

BISMUTH; BISMUTH COMPOUNDS; CRYSTAL GROWTH; CRYSTALLIZATION; PHOTOREACTIVITY; PHOTOREFRACTIVE MATERIALS;

SILICON COMPOUNDS;

EID: 79952735344     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2010.10.185     Document Type: Conference Paper

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