SCOPUS 정보 검색 플랫폼

Nanotechnology

Volumn 22, Issue 16, 2011, Pages

Deep UV nano-microstructuring of substrates for surface plasmon resonance imaging

(7) Dhawan, A a Duval, A b Nakkach, M b Barbillon, G b Moreau, J b Canva, M b Vo Dinh, T a,c

a Duke University (United States)

b UNIV PARIS SUD (France)

c DUKE UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANGLE OF INCIDENCE; DEEP UV; DEEP-UV LITHOGRAPHY; DIFFERENT SIZES; EXPERIMENTAL OBSERVATION; FEATURE SIZES; HIGH DOSE; LIFT-OFF PROCESS; MICRO STRUCTURING; PLASMONIC; RIGOROUS COUPLED WAVE ANALYSIS; SENSOR CHIPS; SPECTRAL REGION; SURFACE PLASMON RESONANCE IMAGING; WAFER SCALE FABRICATION;

PLASMONS; REFRACTIVE INDEX;

SURFACE PLASMON RESONANCE;

NANOMATERIAL;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; PARTICLE SIZE; RADIATION DOSE; RADIATION EXPOSURE; SURFACE PLASMON RESONANCE; SURFACE PROPERTY; ULTRASTRUCTURE; ULTRAVIOLET RADIATION;

CRYSTALLIZATION; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MOLECULAR CONFORMATION; NANOSTRUCTURES; PARTICLE SIZE; RADIATION DOSAGE; SURFACE PLASMON RESONANCE; SURFACE PROPERTIES; ULTRAVIOLET RAYS;

EID: 79952684821 PISSN: 09574484 EISSN: 13616528 Source Type: Journal
DOI: 10.1088/0957-4484/22/16/165301 Document Type: Article

Times cited : (31)

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