Contribution of oxygen partial pressures investigated over a wide range to SrRuO 3 thin-film properties in laser deposition processing

Journal of Applied Physics

Volumn 97, Issue 10, 2005, Pages

  Yoo, Y Z ^a   Chmaissem, O ^a   Kolesnik, S ^a   Dabrowski, B ^a   Maxwell, M ^a   Kimball, C W ^a   McAnelly, L ^a   Haji Sheikh, M ^a   Genis, A P ^a  

^a NORTHERN ILLINOIS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LASER DEPOSITION PROCESSING; OXYGEN PARTIAL PRESSURES; OXYGEN PRESSURES; PULSED LASER DEPOSITION (PLD);

CRYSTALLIZATION; DEPOSITION; LASER ABLATION; OXYGEN; PHASE TRANSITIONS; STRONTIUM COMPOUNDS; THERMAL PLUMES;

THIN FILMS;

EID: 20944445414     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1909284     Document Type: Article

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