Growth mechanism of ALD ZnO films investigated by physical characterization

ECS Transactions

Volumn 33, Issue 2, 2010, Pages 355-363

  Tapily, K ^a   Gu, D ^a   Baumgart, H ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ENERGY DISPERSIVE SPECTROSCOPY; II-VI SEMICONDUCTORS; METALLIC FILMS; OXIDE FILMS; OXIDE MINERALS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THIN FILMS; ZINC METALLOGRAPHY; ZINC OXIDE;

DIETHYL ZINC; GROWTH MECHANISMS; PHYSICAL CHARACTERIZATION; PREFERENTIAL GROWTH; THICKNESS UNIFORMITY; ZINC OXIDE THIN FILMS; ZNO FILMS;

ATOMIC LAYER DEPOSITION;

EID: 79952543362     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3485271     Document Type: Conference Paper

References (6)

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