Influence of sputtering power of Te and annealing on Sb-Te thin films fabricated by RF and DC co-sputtering

Advanced Materials Research

Volumn 194-196, Issue , 2011, Pages 2400-2403

  Chen, Tian Bao ^a   Fan, Ping ^a   Zheng, Zhuang Hao ^a   Zhang, Dong Ping ^a   Cai, Xing Min ^a   Liang, Guang Xing ^a   Chi, Jing Rong ^a  

^a SHENZHEN UNIVERSITY   (China)

Author keywords

Antimony telluride; Co sputtering; Magnetron sputtering; Thermoelectric thin film

Indexed keywords

ANTIMONY TELLURIDE; AS-DEPOSITED FILMS; CO-SPUTTERING; DIRECT CURRENT; ELECTRICAL RESISTIVITY; K9 GLASS; POST TREATMENT; POWER FACTORS; RADIO-FREQUENCY MAGNETRON CO-SPUTTERING; SPUTTERING POWER; THERMOELECTRIC THIN FILMS;

ANNEALING; DC POWER TRANSMISSION; ELECTRIC CONDUCTIVITY; ELECTRIC POWER FACTOR; MAGNETRON SPUTTERING; TELLURIUM; TELLURIUM COMPOUNDS; THIN FILMS;

COBALT;

EID: 79952540111     PISSN: 10226680     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/AMR.194-196.2400     Document Type: Conference Paper

References (10)

1. C.J. Vineis, A. Shakouri, A. Majumdar and M.G. Kanatzidis: Adv. Mater. 22 (2010), p. 3970.
2. L.D. Hicks and M.S. Dresselhaus: Phys. Rev. B 47 (1993), p.12727.
3. J.P. Heremans, V. Jovovic, E.S. Toberer, A. Saramat, A. Kurosaki, A. Charoenphakdee, S. Yamanaka and G.J. Snyder: Science 321 (2008), p. 554.
4. L.E. Bell: Science 321 (2008), p. 1457.
5. M.Y. Kim, T.S. Oh: Thin Solid Films 518 (2010), p. 6550.
6. Y.M. Chen, P.C. Kuo: IEEE Trans. Mag. 34 (1998), p. 432.
7. Y.C. Her, H. Chen, Y.S. Hsu: J. Appl. Phys. 93 (2003), p. 10097.
8. P.Fan, Z.H. Zheng, G.X Liang, X.M. Cai and D.P. Zhang: Chin. Phys. Lett. 27 (2010), p. 087201.
9. P.Fan, Z.H. Zheng, G.X Liang, D.P. Zhang and X.M. Cai: Journal of Alloys and Compounds 505 (2010), p. 278.
10. JCPDS file No.15-0874.