Quantitative characterization of hydroxyl radicals produced by various photocatalysts

Journal of Colloid and Interface Science

Volumn 357, Issue 1, 2011, Pages 163-167

  Xiang, Quanjun ^a   Yu, Jiaguo ^a   Wong, Po Keung ^b  

^a WUHAN UNIVERSITY OF TECHNOLOGY   (China)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Coumarin; Fluorescent probe; Hydroxyl radicals; OH index; Semiconductor photocatalysts

Indexed keywords

BISMUTH COMPOUNDS; CADMIUM SULFIDE; CHLORINE COMPOUNDS; ELECTRIC LAMPS; II-VI SEMICONDUCTORS; MAGNETIC SEMICONDUCTORS; OXIDE MINERALS; PHASE STRUCTURE; PHOTOCATALYSTS; PROBES; SOLUTIONS; SULFUR COMPOUNDS; TITANIUM DIOXIDE; WIDE BAND GAP SEMICONDUCTORS; ZINC OXIDE;

COUMARIN; FLUORESCENT PROBES; HYDROXYL RADICALS; OH-INDEX; SEMICONDUCTOR PHOTOCATALYST;

TUNGSTEN COMPOUNDS;

BISMUTH DERIVATIVE; CADMIUM; COUMARIN; HYDROXYL RADICAL; TITANIUM DIOXIDE; UMBELLIFERONE; XENON; ZINC OXIDE;

ACIDITY; AQUEOUS SOLUTION; ARTICLE; CONTROLLED STUDY; FLUORESCENCE; IRRADIATION; PH; PHOTOCATALYSIS; PHOTOLUMINESCENCE; PRIORITY JOURNAL; SEMICONDUCTOR; SURFACE PROPERTY;

EID: 79952535674     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2011.01.093     Document Type: Article

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