Synthesis and characterization of alkali-soluble photosensitive polysiloxane urethane acrylate

Journal of Applied Polymer Science

Volumn 120, Issue 6, 2011, Pages 3604-3612

  Sun, Fang ^a   Liao, Bo ^b   Zhang, Lu ^a   Du, Hong Guang ^a   Huang, Yue Dong ^c  

^a BEIJING UNIVERSITY OF CHEMICAL TECHNOLOGY   (China)

^b Second Artillery Equipment Academy   (China)

^c JILIN AGRICULTURAL SCIENCE AND TECHNOLOGY COLLEGE   (China)

Author keywords

alkali soluble; photosensitive; polysiloxane; solder resist ink

Indexed keywords

ACRYLATE GROUPS; ACRYLATE MONOMERS; ACRYLIC ACIDS; ALKALI-SOLUBLE; BIFUNCTIONAL; COATING FILMS; DIMETHYLOL PROPIONIC ACID; DOUBLE BONDS; HYDROXYL GROUPS; NUMBER-AVERAGE; OPTIMAL CONCENTRATION; OPTIMUM TEMPERATURE; PHOTO-INITIATOR; PHOTOPOLYMERIZATION KINETICS; PHOTOSENSITIVE; POLYMERIZATION RATES; POLYSILOXANE; POLYSILOXANE-URETHANE; REAL-TIME INFRARED SPECTROSCOPY; SILICONE OIL; SODIUM CARBONATE; SOLDER RESIST INK; SYNTHESIS REACTION; UV IRRADIATION;

ACRYLIC MONOMERS; FATTY ACIDS; HEAT RESISTANCE; INFRARED SPECTROSCOPY; INK; IRRADIATION; LIGHT SENSITIVE MATERIALS; METHANE; OLIGOMERS; ORGANIC ACIDS; PHOTOPOLYMERIZATION; PHOTOSENSITIVITY; SODIUM; SYNTHESIS (CHEMICAL);

SILICONES;

EID: 79952497181     PISSN: 00218995     EISSN: 10974628     Source Type: Journal    
DOI: 10.1002/app.33534     Document Type: Article

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