SCOPUS 정보 검색 플랫폼

Volumn 519, Issue 10, 2011, Pages 3352-3357

Suppression of damage to organic light-emitting layers during deposition of Al-doped ZnO thin films by radio-frequency magnetron sputtering

(3) Yamada, Minoru a,b Matsumura, Michio a Maeda, Yasuhiro b

a OSAKA UNIVERSITY (Japan)

b HITACHI ZOSEN CORPORATION (Japan)

Author keywords

Al doped ZnO; Damage; Magnetron sputtering; Organic light emitting layer

Indexed keywords

AL-DOPED ZNO; AZO FILMS; DAMAGE; GRID ELECTRODES; HIGH DEPOSITION RATES; LOW RESISTIVITY; OPTIMIZED DEPOSITION CONDITIONS; ORGANIC LAYERS; ORGANIC LIGHT-EMITTING; RADIO-FREQUENCY MAGNETRON SPUTTERING SYSTEM; RADIO-FREQUENCY-MAGNETRON SPUTTERING;

ANODIC OXIDATION; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LIGHT EMISSION; MAGNETIC FIELDS; MAGNETRON SPUTTERING; OPTICAL FILMS; OPTIMIZATION; ZINC OXIDE;

ALUMINUM;

EID: 79952314533 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2010.12.097 Document Type: Article

Times cited : (8)

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