Work softening in nanocrystalline materials induced by dislocation annihilation

Scripta Materialia

Volumn 64, Issue 9, 2011, Pages 876-879

  Ungár, Tamás ^a   Li, Li ^b   Tichy, Géza ^a   Pantleon, Wolfgang ^c   Choo, Hahn ^b   Liaw, Peter K ^b  

^a EÖTVÖS LORÁND UNIVERSITY   (Hungary)

^b University of Tennessee   (United States)

^c TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

Author keywords

Dislocations; Work hardening; Work softening; X ray line profile analysis

Indexed keywords

DISLOCATION ANNIHILATION; DISLOCATION DENSITIES; DISLOCATION DENSITY EVOLUTION; DISLOCATIONS; ELECTROCHEMICAL DEPOSITION; EXPERIMENTAL VALUES; SATURATION VALUES; WORK HARDENING; WORK SOFTENING; WORK-HARDENING RATE; X-RAY LINE-PROFILE ANALYSIS;

COLD ROLLING; DIFFERENTIAL EQUATIONS; NANOCRYSTALLINE MATERIALS; PLASTIC DEFORMATION; REDUCTION; STRAIN HARDENING; X RAYS;

X RAY ANALYSIS;

EID: 79952137230     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2011.01.022     Document Type: Article

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