Graphene segregation on Ni/SiO2/Si substrates by alcohol CVD method

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 8, Issue 2, 2011, Pages 577-579

  Miyasaka, Yuta ^a   Matsuyama, Akihiro ^b   Nakamura, Atsushi ^a   Temmyo, Jiro ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

^b Unicraft Nagura Corporation   (Japan)

Author keywords

Catalyst; CVD; Graphene; Segregation

Indexed keywords

AFM; ALCOHOL CVD; CVD; DOMAIN SIZE; GRAPHENE LAYERS; LAYER NUMBER; NI CATALYSTS; NI FILMS; SEGREGATION; SEM; SI SUBSTRATES;

CATALYSTS; ETHANOL; RAMAN SPECTROSCOPY; SEGREGATION (METALLOGRAPHY); SILICON COMPOUNDS; SURFACE ROUGHNESS;

GRAPHENE;

EID: 79951685703     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.201000533     Document Type: Article

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