-
1
-
-
59849096035
-
-
Y. Chen, X. Cheng, M. Liu, Z. Qi, and C. Shi J. Lumin. 129 2009 531 535
-
(2009)
J. Lumin.
, vol.129
, pp. 531-535
-
-
Chen, Y.1
Cheng, X.2
Liu, M.3
Qi, Z.4
Shi, C.5
-
2
-
-
76449092819
-
-
X. Teng, Y. Liu, Y. Liu, Y. Hu, H. He, and W. Zhuang J. Lumin. 130 2010 851 854
-
(2010)
J. Lumin.
, vol.130
, pp. 851-854
-
-
Teng, X.1
Liu, Y.2
Liu, Y.3
Hu, Y.4
He, H.5
Zhuang, W.6
-
5
-
-
77955467517
-
-
G. Lin, G. Dong, D. Tan, X. Liu, Q. Zhang, D. Chen, J. Qiu, Q. Zhao, and Z. Xu J. Alloys Compd. 504 2010 177 180
-
(2010)
J. Alloys Compd.
, vol.504
, pp. 177-180
-
-
Lin, G.1
Dong, G.2
Tan, D.3
Liu, X.4
Zhang, Q.5
Chen, D.6
Qiu, J.7
Zhao, Q.8
Xu, Z.9
-
6
-
-
79951676970
-
-
U.S. Patent (13 June 1995) No. 5,424,006
-
Y. Murayama, N. Takeuchi, Y. Aoki, T. Matsuzawa, U.S. Patent (13 June 1995) No. 5,424,006.
-
-
-
Murayama, Y.1
Takeuchi, N.2
Aoki, Y.3
Matsuzawa, T.4
-
7
-
-
79951679156
-
-
U.S. Patent (25 July 2000) No. 6,093,346
-
Z. Xiao, Z. Xiao, U.S. Patent (25 July 2000) No. 6,093,346.
-
-
-
Xiao, Z.1
Xiao, Z.2
-
8
-
-
23644462676
-
-
F. Clabau, X. Rocquefelte, S. Jobic, P. Deniard, M.-H. Whangbo, A. Garcia, and T. Le Mercier Chem. Mater. 17 2005 3904 3912
-
(2005)
Chem. Mater.
, vol.17
, pp. 3904-3912
-
-
Clabau, F.1
Rocquefelte, X.2
Jobic, S.3
Deniard, P.4
Whangbo, M.-H.5
Garcia, A.6
Le Mercier, T.7
-
11
-
-
70350108487
-
-
H. Wu, Y. Hu, Y. Wang, B. Zeng, Z. Mou, L. Deng, and W. Xie J. Alloys Compd. 486 2009 549 553
-
(2009)
J. Alloys Compd.
, vol.486
, pp. 549-553
-
-
Wu, H.1
Hu, Y.2
Wang, Y.3
Zeng, B.4
Mou, Z.5
Deng, L.6
Xie, W.7
-
13
-
-
0035694916
-
-
T. Aitasalo, J. Hölsä, H. Jungner, M. Lastusaari, and J. Niittykoski J. Lumin. 94-95 2001 59 63
-
(2001)
J. Lumin.
, vol.9495
, pp. 59-63
-
-
Aitasalo, T.1
Hölsä, J.2
Jungner, H.3
Lastusaari, M.4
Niittykoski, J.5
-
14
-
-
0037657461
-
-
T. Aitasalo, P. Doreń, J. Hölsä, H. Jungner, J.-C. Crupa, M. Lastusaari, J. Lengendziewicz, J. Niittykoski, and W. Strek J. Solid State Chem. 171 2003 114 122
-
(2003)
J. Solid State Chem.
, vol.171
, pp. 114-122
-
-
Aitasalo, T.1
Doreń, P.2
Hölsä, J.3
Jungner, H.4
Crupa, J.-C.5
Lastusaari, M.6
Lengendziewicz, J.7
Niittykoski, J.8
Strek, W.9
-
17
-
-
33645545836
-
-
T. Aitasalo, J. Hölsä, H. Jungner, M. Lastusaari, and J. Niittykoski J. Phys. Chem. B 110 2006 4589 4598
-
(2006)
J. Phys. Chem. B
, vol.110
, pp. 4589-4598
-
-
Aitasalo, T.1
Hölsä, J.2
Jungner, H.3
Lastusaari, M.4
Niittykoski, J.5
-
20
-
-
4344564705
-
-
T. Aitasalo, P. Dereń, J. Hölsä, H. Jungner, M. Lastusaari, J. Niittykoski, and W. Strek Radiat. Meas. 38 2004 515 518
-
(2004)
Radiat. Meas.
, vol.38
, pp. 515-518
-
-
Aitasalo, T.1
Dereń, P.2
Hölsä, J.3
Jungner, H.4
Lastusaari, M.5
Niittykoski, J.6
Strek, W.7
-
21
-
-
40849134215
-
-
A.A. Setlur, A.M. Srivastava, H.L. Pham, M.E. Hannah, and U. Happek J. Appl. Phys. 103 2008 53513
-
(2008)
J. Appl. Phys.
, vol.103
, pp. 53513
-
-
Setlur, A.A.1
Srivastava, A.M.2
Pham, H.L.3
Hannah, M.E.4
Happek, U.5
-
23
-
-
18344397916
-
-
W. Drozdowski, D. Wisniewski, A.J. Wojtowicz, A. Lempicki, P. Dorenbos, J.T.M. de Haas, C.W.E. van Eijk, and A.J.J. Bos J. Lumin. 72-74 1997 756 758
-
(1997)
J. Lumin.
, vol.7274
, pp. 756-758
-
-
Drozdowski, W.1
Wisniewski, D.2
Wojtowicz, A.J.3
Lempicki, A.4
Dorenbos, P.5
De Haas, J.T.M.6
Van Eijk, C.W.E.7
Bos, A.J.J.8
-
25
-
-
67649801091
-
-
X. Sun, J. Zhang, X. Zhang, Y. Luo, Z. Hao, and X.-j. Wang J. Appl. Phys. 105 2009 013501
-
(2009)
J. Appl. Phys.
, vol.105
, pp. 013501
-
-
Sun, X.1
Zhang, J.2
Zhang, X.3
Luo, Y.4
Hao, Z.5
Wang, X.-J.6
-
29
-
-
70349934179
-
-
J. Hölsä, T. Laamanen, M. Latsusaari, M. Malkamäki, and P. Novák J. Lumin. 129 2009 1606 1609
-
(2009)
J. Lumin.
, vol.129
, pp. 1606-1609
-
-
Hölsä, J.1
Laamanen, T.2
Latsusaari, M.3
Malkamäki, M.4
Novák, P.5
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