A systematic approach for integrated trend analysis-The case of etching

Technological Forecasting and Social Change

Volumn 78, Issue 3, 2011, Pages 386-407

  Wu, Feng Shang ^a   Hsu, Chun Chi ^a   Lee, Pei Chun ^a,b,c   Su, Hsin Ning ^b  

^a NATIONAL CHENGCHI UNIVERSITY   (Taiwan)

^b NATIONAL APPLIED RESEARCH LABORATORIES   (Taiwan)

^c UNIVERSITY OF SUSSEX   (United Kingdom)

Author keywords

Bibliometric analysis; Etching; Patent analysis; Text mining; Trend analysis

Indexed keywords

BIBLIOMETRIC ANALYSIS; GLOBAL COMPETITION; INTEGRATED ANALYSIS; PATENT ANALYSIS; TECHNOLOGY DEVELOPMENT; TEXT-MINING; TREND ANALYSIS; UNSTRUCTURED DOCUMENTS;

ETCHING;

PATENTS AND INVENTIONS;

DATA MINING; TECHNOLOGICAL DEVELOPMENT; TREND ANALYSIS;

EID: 79951672557     PISSN: 00401625     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.techfore.2010.08.006     Document Type: Article

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