-
1
-
-
0001156613
-
-
0003-6951, 10.1063/1.1332110
-
J. E. Bradby, J. S. Williams, J. Wong-Leung, M. V. Swain, and P. Munroe, Appl. Phys. Lett. 0003-6951 77, 3749 (2000). 10.1063/1.1332110
-
(2000)
Appl. Phys. Lett.
, vol.77
, pp. 3749
-
-
Bradby, J.E.1
Williams, J.S.2
Wong-Leung, J.3
Swain, M.V.4
Munroe, P.5
-
2
-
-
0001753996
-
-
0003-6951, 10.1063/1.126300
-
V. Domnich, Y. Gogotsi, and S. Dub, Appl. Phys. Lett. 0003-6951 76, 2214 (2000). 10.1063/1.126300
-
(2000)
Appl. Phys. Lett.
, vol.76
, pp. 2214
-
-
Domnich, V.1
Gogotsi, Y.2
Dub, S.3
-
3
-
-
33746255234
-
Phase transformations induced by spherical indentation in ion-implanted amorphous silicon
-
DOI 10.1063/1.2210767
-
B. Haberl, J. E. Bradby, S. Ruffell, J. S. Williams, and P. Munroe, J. Appl. Phys. 0021-8979 100, 013520 (2006). 10.1063/1.2210767 (Pubitemid 44090841)
-
(2006)
Journal of Applied Physics
, vol.100
, Issue.1
, pp. 013520
-
-
Haberl, B.1
Bradby, J.E.2
Ruffell, S.3
Williams, J.S.4
Munroe, P.5
-
4
-
-
0038337938
-
-
0884-2914, 10.1557/JMR.2003.0164
-
T. Juliano, Y. Gogotsi, and V. Domnich, J. Mater. Res. 0884-2914 18, 1192 (2003). 10.1557/JMR.2003.0164
-
(2003)
J. Mater. Res.
, vol.18
, pp. 1192
-
-
Juliano, T.1
Gogotsi, Y.2
Domnich, V.3
-
5
-
-
0000163647
-
-
0556-2805, 10.1103/PhysRevB.50.13043
-
J. Crain, G. J. Ackland, J. R. Maclean, R. O. Piltz, P. D. Hatton, and G. S. Pawley, Phys. Rev. B 0556-2805 50, 13043 (1994). 10.1103/PhysRevB.50.13043
-
(1994)
Phys. Rev. B
, vol.50
, pp. 13043
-
-
Crain, J.1
Ackland, G.J.2
MacLean, J.R.3
Piltz, R.O.4
Hatton, P.D.5
Pawley, G.S.6
-
7
-
-
34047189783
-
Annealing kinetics of nanoindentation-induced polycrystalline high pressure phases in crystalline silicon
-
DOI 10.1063/1.2716854
-
S. Ruffell, J. E. Bradby, and J. S. Williams, Appl. Phys. Lett. 0003-6951 90, 131901 (2007). 10.1063/1.2716854 (Pubitemid 46516845)
-
(2007)
Applied Physics Letters
, vol.90
, Issue.13
, pp. 131901
-
-
Ruffell, S.1
Bradby, J.E.2
Williams, J.S.3
-
8
-
-
67249156218
-
-
0021-8979, 10.1063/1.3124366
-
S. Ruffell, B. Haberl, S. Koenig, J. E. Bradby, and J. S. Williams, J. Appl. Phys. 0021-8979 105, 093513 (2009). 10.1063/1.3124366
-
(2009)
J. Appl. Phys.
, vol.105
, pp. 093513
-
-
Ruffell, S.1
Haberl, B.2
Koenig, S.3
Bradby, J.E.4
Williams, J.S.5
-
9
-
-
3743133500
-
-
0031-9007, 10.1103/PhysRevLett.59.473
-
J. M. Besson, E. H. Mokhtari, J. Gonzalez, and G. Weill, Phys. Rev. Lett. 0031-9007 59, 473 (1987). 10.1103/PhysRevLett.59.473
-
(1987)
Phys. Rev. Lett.
, vol.59
, pp. 473
-
-
Besson, J.M.1
Mokhtari, E.H.2
Gonzalez, J.3
Weill, G.4
-
10
-
-
48749083599
-
-
0556-2805, 10.1103/PhysRevB.78.035210
-
B. D. Malone, J. D. Sau, and M. L. Cohen, Phys. Rev. B 0556-2805 78, 035210 (2008). 10.1103/PhysRevB.78.035210
-
(2008)
Phys. Rev. B
, vol.78
, pp. 035210
-
-
Malone, B.D.1
Sau, J.D.2
Cohen, M.L.3
-
11
-
-
55349098801
-
-
0556-2805, (R). 10.1103/PhysRevB.78.161202
-
B. D. Malone, J. D. Sau, and M. L. Cohen, Phys. Rev. B 0556-2805 78, 161202 (R) (2008). 10.1103/PhysRevB.78.161202
-
(2008)
Phys. Rev. B
, vol.78
, pp. 161202
-
-
Malone, B.D.1
Sau, J.D.2
Cohen, M.L.3
-
12
-
-
0036498168
-
Development of refractory ohmic contact materials for gallium arsenide compound semiconductors
-
DOI 10.1016/S1468-6996(01)00150-4, PII S1468699601001504
-
V. Domnich and Y. Gogotsi, Rev. Adv. Mater. Sci. 1606-5131 3, 1 (2002). 10.1016/S1468-6996(01)00150-4 (Pubitemid 34141154)
-
(2002)
Science and Technology of Advanced Materials
, vol.3
, Issue.1
, pp. 1-27
-
-
Murakami, M.1
-
13
-
-
33748285994
-
High pressure crystalline phase formation during nanoindentation: Amorphous versus crystalline silicon
-
DOI 10.1063/1.2339039
-
S. Ruffell, J. E. Bradby, and J. S. Williams, Appl. Phys. Lett. 0003-6951 89, 091919 (2006). 10.1063/1.2339039 (Pubitemid 44319932)
-
(2006)
Applied Physics Letters
, vol.89
, Issue.9
, pp. 091919
-
-
Ruffell, S.1
Bradby, J.E.2
Williams, J.S.3
-
14
-
-
0038004939
-
-
0884-2914, 10.1557/JMR.2003.0104
-
I. Zarudi, L. C. Zhang, and M. V. Swain, J. Mater. Res. 0884-2914 18, 758 (2003). 10.1557/JMR.2003.0104
-
(2003)
J. Mater. Res.
, vol.18
, pp. 758
-
-
Zarudi, I.1
Zhang, L.C.2
Swain, M.V.3
-
15
-
-
33947220218
-
An in situ electrical measurement technique via a conducting diamond tip for nanoindentation in silicon
-
DOI 10.1557/jmr.2007.0100
-
S. Ruffell, J. E. Bradby, and J. S. Williams, J. Mater. Res. 0884-2914 22, 578 (2007). 10.1557/jmr.2007.0100 (Pubitemid 46421244)
-
(2007)
Journal of Materials Research
, vol.22
, Issue.3
, pp. 578-586
-
-
Ruffell, S.1
Bradby, J.E.2
Williams, J.S.3
Warren, O.L.4
-
16
-
-
79951507995
-
-
unpublished
-
S. Ruffell (unpublished).
-
-
-
Ruffell, S.1
-
17
-
-
35949010078
-
-
0031-9007, 10.1103/PhysRevLett.62.1880
-
S. Roorda, S. Doorn, W. C. Sinke, P. M. L. O. Scholte, and E. v. Loenen, Phys. Rev. Lett. 0031-9007 62, 1880 (1989). 10.1103/PhysRevLett.62.1880
-
(1989)
Phys. Rev. Lett.
, vol.62
, pp. 1880
-
-
Roorda, S.1
Doorn, S.2
Sinke, W.C.3
Scholte, P.M.L.O.4
E, V.L.5
-
19
-
-
30344485152
-
Electrical properties of B-doped polycrystalline silicon thin films prepared by rapid thermal chemical vapour deposition
-
DOI 10.1016/j.tsf.2005.10.069, PII S0040609005020900
-
B. Ai, H. Shen, Z. Liang, Z. Chen, G. Kong, and X. Liao, Thin Solid Films 0040-6090 497, 157 (2006). 10.1016/j.tsf.2005.10.069 (Pubitemid 43061078)
-
(2006)
Thin Solid Films
, vol.497
, Issue.1-2
, pp. 157-162
-
-
Ai, B.1
Shen, H.2
Liang, Z.3
Chen, Z.4
Kong, G.5
Liao, X.6
|