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Volumn 98, Issue 5, 2011, Pages

Room temperature writing of electrically conductive and insulating zones in silicon by nanoindentation

Author keywords

[No Author keywords available]

Indexed keywords

DIAMOND CUBIC PHASE; ELECTRICAL PROPERTY; ELECTRICALLY CONDUCTIVE; HIGH-TEMPERATURE PROCESSING; MASK LESS; NEW APPLICATIONS; ROOM TEMPERATURE; SILICON DEVICES; SILICON SUBSTRATES;

EID: 79951501530     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3549191     Document Type: Article
Times cited : (32)

References (19)
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    • (2008) Phys. Rev. B , vol.78 , pp. 161202
    • Malone, B.D.1    Sau, J.D.2    Cohen, M.L.3
  • 12
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    • Murakami, M.1
  • 13
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    • High pressure crystalline phase formation during nanoindentation: Amorphous versus crystalline silicon
    • DOI 10.1063/1.2339039
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    • Ruffell, S.1    Bradby, J.E.2    Williams, J.S.3
  • 15
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    • DOI 10.1557/jmr.2007.0100
    • S. Ruffell, J. E. Bradby, and J. S. Williams, J. Mater. Res. 0884-2914 22, 578 (2007). 10.1557/jmr.2007.0100 (Pubitemid 46421244)
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    • unpublished
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.