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Volumn 20, Issue 1, 2011, Pages
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A large-volume microwave plasma source based on parallel rectangular waveguides at low pressures
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC EMISSION SPECTROMETRY;
ELECTRON DENSITIES;
FIELD PATTERNS;
GEOMETRICAL PROPERTY;
GOOD STABILITY;
HIGH DENSITY;
INTERFEROGRAMS;
LOW PRESSURES;
METAL PLATES;
MICROWAVE CAVITY;
MICROWAVE ENERGIES;
MICROWAVE PLASMA;
MICROWAVE PLASMA SOURCES;
MICROWAVE POWER;
NUMERICAL SIMULATION;
PLASMA CHAMBERS;
PLASMA ELECTRON DENSITY;
QUARTZ GLASS;
WORKING GAS;
ARGON;
CARRIER CONCENTRATION;
DENSITY FUNCTIONAL THEORY;
ELECTRIC FIELDS;
ELECTRIC PROPERTIES;
ELECTRON DENSITY MEASUREMENT;
ELECTRON TEMPERATURE;
HELIUM;
MICROWAVE GENERATION;
MICROWAVE POWER TRANSMISSION;
PLASMA SOURCES;
PLASMA STABILITY;
QUARTZ;
RECTANGULAR WAVEGUIDES;
NITROGEN PLASMA;
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EID: 79551708532
PISSN: 09630252
EISSN: 13616595
Source Type: Journal
DOI: 10.1088/0963-0252/20/1/015025 Document Type: Article |
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Times cited : (9)
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References (9)
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