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Volumn 7716, Issue , 2010, Pages

High performance gratings for space applications

Author keywords

Effective medium; Electron beam lithography; Gratings; Space application

Indexed keywords

CRITICAL PARAMETER; EARTH OBSERVATIONS; EFFECTIVE MEDIUM; GRATING PERIODS; GRATINGS; HIGH DISPERSION; OPTICAL PERFORMANCE; OPTIMAL PERFORMANCE; POLARIZATION DEPENDENCY; SATELLITE INSTRUMENTS; SPACE ENVIRONMENT; SPACE MISSIONS; SUB-STRUCTURES; WAVEFRONT ERRORS;

EID: 79551702867     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.854951     Document Type: Conference Paper
Times cited : (10)

References (6)
  • 1
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    • Parametric optimization of multilevel diffractive optical elements by electromagnetic theory
    • Oct.
    • E. Noponen, J. Turunen, A. Vasara, "Parametric optimization of multilevel diffractive optical elements by electromagnetic theory," Appl. Opt. Vol. 31 No. 28, 5910-5912, Oct. 1992.
    • (1992) Appl. Opt. , vol.31 , Issue.28 , pp. 5910-5912
    • Noponen, E.1    Turunen, J.2    Vasara, A.3
  • 3
    • 0000321363 scopus 로고
    • Artifical distributed-index media fabricated by zero-order gratings
    • Dec.
    • W. Stork, N. Streibl, H. Heidner, and P. Kipfer, "Artifical distributed-index media fabricated by zero-order gratings," Opt. Lett. Vol. 16 No. 24, 1921-1923, Dec. 1991.
    • (1991) Opt. Lett. , vol.16 , Issue.24 , pp. 1921-1923
    • Stork, W.1    Streibl, N.2    Heidner, H.3    Kipfer, P.4
  • 4
    • 0000249491 scopus 로고    scopus 로고
    • Blazed binary subwavelength gratings with efficiencies larger than those of conventional échelette gratings
    • Jul.
    • P. Lalanne, S. Astilean, P. Chavel, E. Cambril, H. Launois, "Blazed binary subwavelength gratings with efficiencies larger than those of conventional échelette gratings," Opt. Lett. Vol. 23 No. 14, 1081-1083, Jul. 1998.
    • (1998) Opt. Lett. , vol.23 , Issue.14 , pp. 1081-1083
    • Lalanne, P.1    Astilean, S.2    Chavel, P.3    Cambril, E.4    Launois, H.5
  • 5
    • 0031389573 scopus 로고    scopus 로고
    • Continuous profile writing by electron and optical lithography
    • Dec.
    • E.-B. Kley, "Continuous profile writing by electron and optical lithography," Microelectr. Eng. Vol. 34, 261-298, Dec. 1997.
    • (1997) Microelectr. Eng. , vol.34 , pp. 261-298
    • Kley, E.-B.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.