Nickel oxalate nanowires grown on electrochemically deposited ni thin film

Journal of the Electrochemical Society

Volumn 158, Issue 3, 2011, Pages

  Jung, I ^a   Lee, Y ^a   Tak, Y ^a   Choi, J ^a  

^a Inha University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITED FILMS; DEPOSITION TIME; NI THIN FILMS; NICKEL LAYERS; NICKEL OXALATE; NICKEL THIN FILM; OXALIC ACID; TOTAL SURFACE AREA;

ELECTRODEPOSITION; ITO GLASS; NANOWIRES; ORGANIC ACIDS; SURFACE ROUGHNESS; THIN FILMS; VAPOR DEPOSITION;

NICKEL;

EID: 79551598739     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3529938     Document Type: Article

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