Nanostructured MoSx-based thin films obtained by electrochemical reduction

Electrochimica Acta

Volumn 56, Issue 5, 2011, Pages 2433-2442

  Ghosh, S K ^a   Bera, T ^b   Karacasu, O ^a   Swarnakar, A ^a   Buijnsters, J G ^a   Celis, J P ^a  

^a UNIVERSITY OF LEUVEN   (Belgium)

^b NATIONAL INSTITUTE OF TECHNOLOGY   (India)

Author keywords

Coefficient of friction; Electrochemical deposition; IF MoS2; MoS2 nanotube; Thin film

Indexed keywords

AMBIENT AIR; AQUEOUS SOLUTIONS; AS-DEPOSITED THIN FILMS; CATALYTIC EFFECTS; COEFFICIENT OF FRICTIONS; ELECTROCHEMICAL DEPOSITION; ELECTROCHEMICAL REDUCTIONS; HIGH TEMPERATURE X-RAY DIFFRACTION; IF-MOS2; IN-SITU; INORGANIC FULLERENES; MOS2 NANOTUBE; NANO-STRUCTURED; NANOBALLS; NANORIBBONS; RELATIVE HUMIDITIES; SEM; TEMPERATURE-INDUCED TRANSFORMATIONS; VARIOUS SUBSTRATES; XRD CRYSTAL STRUCTURE;

AMORPHOUS FILMS; ANNEALING; ATMOSPHERIC HUMIDITY; CRYSTAL STRUCTURE; CRYSTALLINE MATERIALS; ELECTROCHEMISTRY; ELECTRODEPOSITION; ELECTROLYTIC REDUCTION; FRICTION; NANORODS; NANOTUBES; RAMAN SPECTROSCOPY; THIN FILMS; TRANSITION METALS; TRANSMISSION ELECTRON MICROSCOPY; TRIBOLOGY; VAPOR DEPOSITION; X RAY DIFFRACTION;

MOLYBDENUM COMPOUNDS;

EID: 79551550770     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2010.10.065     Document Type: Article

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