Electrochemical deposition of MoS2 thin films by reduction of tetrathiomolybdate

Thin Solid Films

Volumn 280, Issue 1-2, 1996, Pages 86-89

  Ponomarev, E A ^a,c   Neumann Spallart, M ^a   Hodes, G ^b   Levy Clement C ^a  

^a CNRS   (France)

^b WEIZMANN INSTITUTE OF SCIENCE   (Israel)

^c SEMENOV INSTITUTE OF CHEMICAL PHYSICS   (Russian Federation)

Author keywords

Deposition process; Electrochemistry; Molybdenum disulphide; Semiconductors

Indexed keywords

ANNEALING; BAND STRUCTURE; COMPOSITION; ELECTRODEPOSITION; MOLYBDENUM COMPOUNDS; OPTICAL PROPERTIES; SODIUM COMPOUNDS; SOLUTIONS; X RAYS;

MICROPROBE ANALYSIS; MOLYBDENUM DISULPHIDE; SODIUM TETRATHIOMOLYBDATE;

SEMICONDUCTING FILMS;

EID: 0030191126     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)08204-2     Document Type: Article

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