Radical photopolymerization reactions under air upon lamp and diode laser exposure: The input of the organosilane radical chemistry

Progress in Organic Coatings

Volumn 70, Issue 2-3, 2011, Pages 83-90

  Lalevée, Jacques ^a   Tehfe, Mohamad Ali ^a   Morlet Savary, Fabrice ^a   Graff, Bernadette ^a   Allonas, Xavier ^a   Fouassier, Jean Pierre ^a  

^a UNIVERSITÉ DE HAUTE ALSACE   (France)

Author keywords

Laser diodes; Organosilanes; Oxygen inhibition; Photopolymerization

Indexed keywords

CONCEPT-BASED; DIODE LASERS; EXPERIMENTAL CONDITIONS; FREE RADICAL PHOTOPOLYMERIZATION; LASER DIODES; LOW VISCOSITY; LOW-INTENSITY; ORGANOSILANES; OXYGEN INHIBITION; PEROXYL RADICAL; PHOTOINITIATING SYSTEMS; RADICAL CHEMISTRY; RADICAL PHOTOPOLYMERIZATION; SELECTED EXAMPLES; TYPE II; VISIBLE LIGHT;

DIODES; FREE RADICALS; IODINE; OXYGEN; PHOTOPOLYMERIZATION;

SILANES;

EID: 79551491113     PISSN: 03009440     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.porgcoat.2010.10.008     Document Type: Article

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