Role of bimolecular homolytic substitution (SH2) reactions in free radical photopolymerization under air

Macromolecules

Volumn 43, Issue 5, 2010, Pages 2219-2227

  El Roz, Mohamad ^a   Tehfe, Mohamad Ali ^a   Lalevée, Jacques ^a   Graff, Bernadette ^a   Allonas, Xavier ^a   Fouassier, Jean Pierre ^a  

^a UNIVERSITÉ DE HAUTE ALSACE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CO-INITIATORS; DIMETHYLAMIDO; ELECTRON SPIN RESONANCE; EXPERIMENTAL CONDITIONS; FREE RADICAL PHOTOPOLYMERIZATION; HOMOLYTIC SUBSTITUTION; LASER FLASH PHOTOLYSIS; LOW LIGHT; LOW VISCOSITY; MULTIVALENT ATOMS; OXYGEN EFFECT; PHOSPHINE OXIDE; PHOTOINITIATING SYSTEMS; PHOTOINITIATORS; POLYMERIZATION RATES; PROPANONE; TETRAKIS; TYPE II;

ACETONE; FREE RADICALS; OXYGEN; PHOSPHORUS COMPOUNDS; PHOTOLYSIS; PHOTOPOLYMERIZATION; SPIN DYNAMICS; SULFUR COMPOUNDS; TIN; TITANIUM; TITANIUM OXIDES; ZIRCONIUM;

TERNARY SYSTEMS;

EID: 77649205135     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma902802s     Document Type: Article

References (50)

1. (a) Fouassier, J. P. Photoinitiation, Photopolymerization, and Photocuring: Fundamental and Applications; Hanser Publishers: New York, 1995.
2. (b) Fouassier, J. P. In Radiation Curing in Polymer Science and Technology; Fouassier, J. P., Rabek, J. F., Eds.; Elsevier Science Publishers: London, 1993.
3. (c) Photochemistry and UV Curing; Fouassier, J. P., Ed.; Research Signpost: Trivandrum, India, 2006.
4. (c) Basics and Applications of Photopolymerization Reactions; Fouassier, J. P., Alionas, X., Eds.; Research Signpost: Trivandrum, India, in press.
5. Pappas, S. P. UV Curing Science and Technology; Technology Marketing Corp.: Stamford, CT, 1978.
6. Dietliker,K. Chemistry & Technology of UV & EB Formulation for Coatings, Inks, & Paints; SITA Technology: London, 1991.
7. (a) Davidson, R. S. Exploring the Science, Technology, and Applications of UV and EB Curing; SITA Technology: London, 1999.
8. (b) Schwalm, R. UV Coatings: Basics, Recent Developments, and New Applications; Elsevier: Oxford, U.K., 2007
9. (a) Photoresponsive Polymers; Krongauz, V., Trifunac, A., Eds.; Chapman and Hall: New York, 1994.
10. (b) Neckers, D. C. UV and EB at the Millenium; Sita Technology: London, 1999.
11. (c) Reiser, A. Photoreactive Polymers: The Science and Technology of Resists; Wiley: New York, 1989.
12. (a) Hoyle, C. E.; Kim, K.-J. J. Radial. Curing 1985, 9-15.
13. (b) Decker, C.; Jenkins, A. D. Macromolecules 1985, 18, 1241-1244.
14. (c) Andizejewska, E.; Zyeh-Tomkoviak, D.; Andrezejewski, M.; Hug, G. L.; Marciniak, B. Macromolecules 2006, 93, 3777-3785.
15. Krongauz, V. V.; Chawla, C. P.; Dupre, J. In Photoinitiated Polymerization; Belfield, K., Crivello, J. V., Eds.; ACS Symposium 847; American Chemical Society: Washington, DC, 2003.
16. Decker, C. Makromol. Chem., Macromol. Chem. Phys. 1979, 180, 2027-2030.
17. Miller, C. W.; Hoyle, C. E.; Jonsson, S.; Nason, C.; Lee, T. Y.; Kuang, W. F.; Viswanathan, K. In Photoinitiated Polymerization; Belfield, K., Crivello, J. V., Eds; ACS Symposium 847; American Chemical Society: Washington, DC, 2003.
18. (a) Lalevé, J.; Dirani, A.; El-Roz, M.; Allonas, X.; Fouassier, J. P. Macromolecules 2008, 41, 2003-2010.
19. (b) Lalevée, J.; Blanchard, N.; Graff, B.; Allonas, X.; Fouassier, J. P. J. Organomet. Chem. 2008, 693, 3643-3649.
20. Lalevée, J.; Blanchard, N.; El-Roz, M.; Graff, B.; Allonas, X.; Fouassier, J. P. Macromolecules 2008, 41, 4180-4186.
21. Decker, C; Faure, J.;Fizet, M.; Rychla, L. Photogr. Sci. Eng. 1979, 23,137-140.
22. (a) Davidson, R. S. In Radiation Curing in Polymer Science and Technology; Fouassier, J. P., Rabek, J. F., Eds.; Elsevier Science Publishers: London, 1993.
23. (b) Jacobine, A. T. In Radiation Curing in Polymer Science and Technology; Fouassier, J. P., Rabek, J. F., Eds.; Elsevier Science Publishers: London, 1993.
24. (c) Gush, D. P.; Ketley, A. D. Mod. Paint. Coat. 1978, 68, 61-72.
25. Lecamp, L.; Houllier, F.; Youssef, B.; Bunel, C. Polymer 2001 , 42, 2727-2736.
26. Cramer, N. B.; Bowman, C. N. Polym. Sci, Part A: Polym. Chem. 2001, 39, 3311-3319.
27. Ingold K. U.; Roberts, B. P. In Free Radical Substitution Reactions; Wiley Interscience: New York, 1971.
28. El-Roz, M.; Lalevée, J.; Allonas, X.; Fouassier, J.-P. Macromol. Rapid Commun. 2008, 29, 804-808.
29. Lalevée, J.; El-Roz, M.; Alionas, X.; Fouassier, J. P. J. Polym. Sci, Part A: Polym. Chem. 2008, 46, 2008-2014.
30. Lalevée, J.; Allonas, X.; Jradi, S.; Fouassier, J.-P. Macromolecules 2006, 59, 1872-1879.
31. Lalevée, J.; Allonas, X.; Fouassier, J. P. J. Am. Chem. Soc. 2002, 124, 9613-9621.
32. (a) Furimsky, E.; Howard, J. A. J. Am. Chem. Soc, 1973, 95, 369-379.
33. (b) Burton, B. W.; Doba, T.; Gabe, E. J.; Hughes, L.; Lee, F. L.; Prasad, L.; Ingold, K. U. J. Am. Chem. Soc. 1985, 107, 7053-7065.
34. (c) Fukuzumi, S.; Shimoosako, K.; Suenobu, T.; Watanabe, Y. J. Am. Chem. Soc, 2003, 125, 9074-9082.
35. (d) Griller, D.; Howard, J. A.; Marriott, P. R.; Scaiano, J. C. J. Am. Chem. Soc. 1981, 103, 619-623.
36. (a) Frisch, M. J.; Trucks, G. W.; Schlegel, H. B.; Scuseria, G. E.; Robb, M. A.; Cheeseman, J. R.; Zakrzewski, V. G.; Montgomery, J. A., Jr.; Stratmann, R. E.; Burant, J. C.; Dapprich, S.; Millam, J. M.; Daniels, A. D.; Kudin, K. N.; Strain, M. C.; Farkas, O.; Tomasi, J.; Barone, V.; Cossi, M.; Cammi, R.; Mennucci, B.; Pomelli, C.; Adamo, C.; Clifford, S.; Ochterski, J.; Petersson, G. A.; Ayala, P. Y.; Cui, Q.; Morokuma, K.; Salvador, P.; Dannenberg, J. J.; Malick, D. K.; Rabuck, A. D.; Raghavachari, K.; Foresman, J. B.; Cioslowski, J.; Ortiz, J. V.; Baboul, A. G.; Stefanov, B. B.; Liu, G.; Liashenko, A.; Piskorz, P.; Komaromi, I.; Gomperts, R.; Martin, R. L.; Fox, D. J.; Keith, T.; Al-Laham, M. A.; Peng, C.Y.; Nanayakkara, A.; Challacombe M.; Gill, P. M. W.; Johnson, B.; Chen, W.; Wong, M. W.; Andres, J. L.; Gonzalez, C.; Head-Gordon, M.; Replogle, E. S.; Pople, J. A. GAUSSIAN 03, revision B-2; Gaussian, Inc.: Pittsburgh, PA, 2003.
37. (b) Foresman, J. B.; Frisch, A. In Exploring Chemistry with Electronic Structure Methods, 2nd ed.; Gaussian, Inc.: Pittsburgh, PA, 1996.
38. (a) Mason, M. R.; Fneich, B. N.; Kirschbaum, K. Inorg. Chem. 2003, 42, 6592-6594.
39. (b) Ward, D. B.; Risler, H.; Weitershans, K.; Bellemin-Laponnoz, S.; Wadepohl, H.; Gade, L. H. Inorg Chem. 2006, 45, 7777-7787.
40. El-Roz, M.; Lalevée, J.; Allonas, X.; Fouassier, J. P. Macromolecules 2009, 42, 8725-8732.
41. Lalevée, J.; Graff, B.; Allonas, X.; Fouassier, J. P. Phys. Chem. A 2007, 111, 6991-6998.
42. Lalevée, J.; Gigmes, D.; Bertin, D.; Graff, B.; Allonas, X.; Fouassier, J. P. Chem. Phys. Lett. 2007, 438, 346-350.
43. Lalevée, J.; Allonas, X.; Genet, S.; Fouassier, J. P. J. Am. Chem. Soc. 2003, 125, 9377-9380.
44. Lalevée, J.; Allonas, X.; Fouassier, J. P. Chem Phys. Lett. 2007, 445, 62-67.
45. Davies, A. G.; Roberts, B. P. In Free Radicals; Kochi, J. K., Ed.; Wiley: New York, 1973.
46. Davies, A. G.; Roberts, B. P. J.,Chem. Soc, B 1971, 1830-1837.
47. Davies, A. G.; Griller, D.; Roberts, B. P. J. Chem. Soc. B 1971, 1823-1829.
48. (a) Rabek, J. F. Mechanisms of Photophysical and Photochemical Reactions in Polymer: Theory and Practical Applications; Wiley: New York, 1987.
49. (b) Rabek, J. F. Photostabilization of Polymers: Principles and Applications; Elsevier: New York, 1990.
50. Allonas, X.; Fouassier, J. P.; Kaji, M.; Murakami, S. photochem. photobiol. Sci 2003, 2, 224-229.