Total-reflection inelastic x-ray scattering from a 10-nm thick La 0.6Sr0.4CoO3 thin film

Physical Review Letters

Volumn 106, Issue 3, 2011, Pages

  Fister, T T ^a   Fong, D D ^a   Eastman, J A ^a   Iddir, H ^a   Zapol, P ^a   Fuoss, P H ^a   Balasubramanian, M ^b   Gordon, R A ^c   Balasubramaniam, K R ^d   Salvador, P A ^d  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

^c SIMON FRASER UNIVERSITY   (Canada)

^d CARNEGIE MELLON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL CHANGE; FINAL STATE; INELASTIC X RAY SCATTERING; NANOMETER RESOLUTIONS; NEW APPROACHES; O K-EDGES; SOFT-X-RAY ABSORPTION; SRTIO; SUB-KEV; X RAY REFLECTION;

COBALT COMPOUNDS; DEPTH PROFILING; ELECTRONIC STRUCTURE; SCATTERING; SURFACE STRUCTURE; THIN FILMS; X RAY SCATTERING;

X RAYS;

EID: 78751552241     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.106.037401     Document Type: Article

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