Substrate-modified ferrimagnetism in MnGa films

Journal of Applied Physics

Volumn 108, Issue 11, 2010, Pages

  Feng, Wuwei ^a   Van Thiet, Duong ^a   Dung, Dang Duc ^a   Shin, Yooleemi ^a   Cho, Sunglae ^a  

^a University of Ulsan   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

FERRIMAGNETS; NEW APPLICATIONS; SPINTRONIC DEVICE;

CRYSTAL ORIENTATION; CRYSTAL SYMMETRY; FERRIMAGNETISM; GALLIUM; MAGNETIC MOMENTS; MAGNETIC PROPERTIES; MANGANESE; SUBSTRATES;

GALLIUM ALLOYS;

EID: 78751516430     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3517083     Document Type: Article

References (21)

1. E. Wachtel and K. J. Nier, Z. Metallkd. 0044-3093 56, 779 (1965).
2. H. -G. Meibner and K. Schubert, Z. Metallkd. 0044-3093 56, 523 (1965).
3. H. Niida, T. Hori, H. Onodera, Y. Yamaguchi, and Y. Nakagawa, J. Appl. Phys. 0021-8979 79, 5946 (1996). 10.1063/1.362115
4. J. S. Wu and K. H. Kuo, Metall. Mater. Trans. A 1073-5623 28, 729 (1997). 10.1007/s11661-997-0059-9
5. O. Gourdon and G. J. Miller, J. Solid State Chem. 0022-4596 173, 137 (2003). 10.1016/S0022-4596(02)00031-2
6. T. Matsui, M. Suzuki, K. Morii, and Y. Nakayama, J. Appl. Phys. 0021-8979 73, 6683 (1993). 10.1063/1.352501
7. V. Prudnikov, V. Silonov, M. Prudnikova, and S. Rodin, J. Magn. Magn. Mater. 0304-8853 188, 393 (1998). 10.1016/S0304-8853(98)00193-0
8. S. Mangin, D. Ravelosona, J. A. Katine, M. J. Carey, B. D. Terris, and E. E. Fullerton, Nature Mater. 1476-1122 5, 210 (2006). 10.1038/nmat1595 (Pubitemid 43320636)
9. H. Meng and J. P. Wang, Appl. Phys. Lett. 0003-6951 88, 172506 (2006). 10.1063/1.2198797
10. N. Nishimura, T. Hirai, A. Koganei, T. Ikeda, K. Okano, Y. Sekiguchi, and Y. Osada, J. Appl. Phys. 0021-8979 91, 5246 (2002). 10.1063/1.1459605 (Pubitemid 34599000)
11. J. H. Park, C. Park, T. Jeong, M. T. Moneck, N. T. Nufer, and J. G. Zhu, J. Appl. Phys. 0021-8979 103, 07A917 (2008). 10.1063/1.2838754 (Pubitemid 351538127)
12. K. M. Krishnan, Appl. Phys. Lett. 0003-6951 61, 2365 (1992). 10.1063/1.108245
13. M. Tanaka, J. P. Harbison, J. Deboeck, T. Sands, B. Philips, T. L. Cheeks, and V. G. Keramidas, Appl. Phys. Lett. 0003-6951 62, 1565 (1993). 10.1063/1.108642
14. B. Balke, G. H. Fecher, J. Winterlik, and C. Felser, Appl. Phys. Lett. 0003-6951 90, 152504 (2007). 10.1063/1.2722206 (Pubitemid 46609862)
15. J. Winterlik, B. Balke, G. H. Fecher, and C. Felser, Phys. Rev. B 0556-2805 77, 054406 (2008). 10.1103/PhysRevB.77.054406
16. F. Wu, S. Mizukami, D. Watanabe, H. Naganuma, M. Oogane, Y. Ando, and T. Miyazaki, Appl. Phys. Lett. 0003-6951 94, 122503 (2009). 10.1063/1.3108085
17. E. Lu, D. C. Ingram, A. R. Smith, J. W. Knepper, and F. Y. Yang, Phys. Rev. Lett. 0031-9007 97, 146101 (2006). 10.1103/PhysRevLett.97.146101 (Pubitemid 44498324)
18. T. A. Bither and W. H. Cloud, J. Appl. Phys. 0021-8979 36, 1501 (1965). 10.1063/1.1714349
19. Y. Nukaga, M. Ohtake, M. Futamoto, F. Kirino, N. Fujita, and N. Inaba, IEEE Trans. Magn. 0018-9464 45, 2519 (2009). 10.1109/TMAG.2009.2018643
20. K. Shikada, M. Ohtake, F. Kirino, and M. Futamoto, J. Appl. Phys. 0021-8979 105, 07C303 (2009). 10.1063/1.3067854
21. C. L. Chien and C. R. Westgate, Hall Effect and Its Applications (Plenum, New York, 1980).